Národní úložiště šedé literatury Nalezeno 14 záznamů.  1 - 10další  přejít na záznam: Hledání trvalo 0.01 vteřin. 
Influence of the gas used on amplification of signals in environmental SEM
Romanovský, Vladimír ; Neděla, Vilém ; Autrata, Rudolf
Commercially available Environmental and Low Vacuum scanning electron microscopy permits a low pressure of gas in the specimen chamber. These instruments are possible to be used for observing of uncoated nonconductive or pure conductive or water containing specimens without the necessary dryingand using other special preparation techniques. Contemporarily, these microscopes come in use mainly in biology, medicine, as well as in the semiconductor industry.
Combined detector for BSE, SE and BSE+SE detection in a low voltage SEM
Autrata, Rudolf ; Jirák, Josef ; Romanovský, Vladimír ; Špinka, Jiří
Specimen observation at a low accelerating voltage of the electron beam (around 1kV) is a new and attractive technique of scanning electron microscopy. While detection to the signal of secondary electrons (SE) with the help of the scintillation-photomultiplier system described by Everhart-Thornley does not depend on the primary beam energy, the detection of backscattered electrons (BSE), having their energy only a bit lower than energy of the beam, is limited by a low sensitivity of semiconductor or channel plate detectors to channel plate detectors to electrons of energy below 2 keV.
Influence of magnetic field upon detection in environmental SEM
Romanovský, Vladimír ; Neděla, Vilém
The single-pole magnetic lens has been constructed and placed co-axially with the beam of primary electrons below the specimen holder. A scheme of its configuration is shown in Figure 1. The lens had to be designed with consideration to the size of space available in the specimen chamber. The situation was complicated by the necessity of placing a magnet below the specimen holder. For this reason the height of 30 mm and diameter of 55 mm of the magnetic lens were chosen. The dependency of induction B on the current I through the magnet was measured by a T-meter.
Imaging of the voltage contrast in environmental SEM
Romanovský, Vladimír ; Autrata, Rudolf
Current methodology of imaging in the scanning electron microscopy is based on the detection of signal electrons that carry topografic and materialcontrast of specimens under study. Electronic devices can be observed because in their standard working mode voltage differences on component surfaces are visualized by means of the voltage contrast. This contrast can be acquired in nearly any commercially available scanning electron microscopeby detection and subsequent analysis of secondary electrons.
Electrostatic mini SLEEM for surface studies
Romanovský, Vladimír ; El-Gomati, M.
Exploitation of the low-energy electrons is advantageous for several reasons. One of them is their smaller penetration depth into the material, which reveals itself as favourable for the surface analysis. Using the low-energy electrons even causes partial, and in some cases total elimination ofcharging effects at non-conductive or slightly conductive specimens. Slowprimary electrons (PE) cause only reduced radiation damage of specimens.
Influence of the cross-section of gas molecules upon detection on the environmental SEM
Neděla, Vilém ; Romanovský, Vladimír
Environmental scanning electron microscopy exploits presence of gas or water vapour in the specimen chamber. Molecules of the gaseous environment can be ionised by electrons, which can compensate the surface charge on thespecimen (at the pressure approx. 200 Pa). At higher pressure of gases and water vapour in the specimen chamber (more than 609 Pa) specimens with content of water can be observed.
Recent trends in low voltage scanning electron microscopy for the imaging of semiconductor devices
Hutař, Otakar ; Müllerová, Ilona ; Romanovský, Vladimír ; Zobačová, Jitka
The technology of semiconductor devices microfabrication becomes presently the main consumer of imaging methods by means of low voltage scanning electron microscopy (LVSEM). The main tasks are the inspection after lithograophic masking and etching processes, including measurements of critical linewidth dimension (CD), and the imaging of three dimensional high aspect ratio structures.
Imaging of semiconductor structures in environmental SEM
Romanovský, Vladimír ; Hutař, Otakar
The charging effects are encountered very often when the semiconductor specimens are observed. There are several possibilities how to eliminate these undesirable phenomena. One of the newest methods how to suppress charging of specimens is environmental scanning electron microscopy (ESEM). Ionisation of gas molecules caused by impacts of primary beam electrons and signal electrons in the close vicinity of the specimen surface removes the surface charge. The ionisation detectors used in ESEM enable one to obtain similar information as in classical SEM.
Combined scintillation and ionisation detectors for environmental scanning electron microscopes
Romanovský, Vladimír ; Autrata, Rudolf
One of the recent directions in the field of scanning electron microscopy deals with observation of specimens at higher pressures in the specimen chamber. Owing to the presence of the gaseous medium, charging effects are suppressed for specimens of insulation character, and at the same time the observation of biological specimens without their prior treatment is made possible. The constructed combined scintillation and ionisation detector extends the applications of these microscopes and enables copmarison of behaviour and properties of both detectors.
Application of low-energy backscattered electron detection in the inspection of semiconductor devices technology
Hutař, Otakar ; Oral, Martin ; Müllerová, Ilona ; Romanovský, Vladimír
The low energy backscattered electron (BSE) detector, equipped with an electrostatic immersion lens for the retardation of the primary electron beam (PE) was elaborated and used for the imaging of surface semiconductor device specimens in a commercial SEM. Despite the signal of BSE is generally lower than that obtained using secondary electrons (SE), the achieved results predestine this BSE detection method as a suitable tool for the inspection of the fine structures of semiconductor devices and linewidth measurement of critical dimension (CD).

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