National Repository of Grey Literature 28 records found  1 - 10nextend  jump to record: Search took 0.00 seconds. 
Characterization of hydrogenated silicon thin films and diode structures with integrated silicon and germanium nanoparticles
Stuchlík, Jiří ; Fajgar, R. ; Remeš, Zdeněk ; Kupčík, Jaroslav ; Stuchlíková, Hana
P-I-N diode structures based on the thin films of amorphous hydrogenated silicon (a-Si:H) deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) technique were prepared with embedded Si and Ge nanoparticles. The Reactive Laser Ablation (RLA) of germanium target was used to cover the intrinsic a-Si:H layer by Ge NPs under a low pressure of the silane. The RLA was performed using focused excimer ArF laser beam under SiH4 background atmosphere. Reaction between ablated Ge NPs and SiH4 led to formation of Ge NPs covered by thin GeSi:H layer. The deposited NPs were covered and stabilized by a-Si:H layer by PECVD. Those two deposition processes were alternated repeatedly. Volt-ampere characteristics of final diode structures were measured in dark and under illumination as well as their electroluminescence spectra.
Germanium and tin nanoparticles encapsulated in amorphous silicon matrix for optoelectronic application
Stuchlíková, The-Ha ; Remeš, Zdeněk ; Stuchlík, Jiří
The plasma enhanced chemical vapour deposition was combined with in situ deposition of Ge and Sn thin film by evaporation technique at surface temperature about 220 °C to form nanoparticles on the surface of hydrogenated silicon thin films to prepare diodes. Formation of nanoparticles was additionally stimulated by plasma treatment through a low pressure hydrogen glow discharge. The diodes based on PIN diode structures with and without the embedded Ge or Sn nanoparticles were characterized by temperature dependence of electrical conductivity, activation energy of conductivity, measurement of volt-ampere characteristics in dark and under solar illumination\n
Relation between optical and microscopic properties of hydrogenated silicon thin films with integrated germanium and tin nanoparticles
Stuchlík, Jiří ; Stuchlíková, The-Ha ; Čermák, Jan ; Kupčík, Jaroslav ; Fajgar, R. ; Remeš, Zdeněk
The hydrogenated amorphous silicon layers (a-Si:H) were deposited by PECVD method on quartz substrates. During interruption of PECVD process the vacuum chamber was pumped up to 10-5 Pa and 1 nm thin films of Germanium or Tin were evaporated on the surface. The materials form isolated nanoparticles (NPs) on the a-Si:H surface. Then the deposited NPs were covered and stabilized by a-Si:H layer by PECVD. Those two deposition processes were alternated 5 times. The a-Si:H thin films with integrated Ge or Sn NPs were characterized optically by PDS and CPM methods, and microscopically by SEM and AFM microscopies. Optical and microscopic properties of the structures are correlated and discussed considering their application in photovoltaics.\n
The photoluminescence and optical absorptance of plasma hydrogenated nanocrystalline ZnO thin films
Remeš, Zdeněk ; Chang, Yu-Ying ; Stuchlík, Jiří ; Mičová, J.
We have developed the technology of the deposition of the nominally undoped ZnO nanocrystalline thin films by DC reactive magnetron sputtering of Zn target in the gas mixture of argon and oxygen plasma. We have optimized the photoluminescence spectroscopy for measuring optically scattering thin layers with the high sensitivity, precise sample positioning and very low influence of the scattered excitation light. Here we present the latest results on the enhancement of the photoluminescence of the nanocrystalline ZnO thin films after plasma hydrogenation. The photoluminescence in near UV region has been enhanced whereas the deep defect related photoluminescence has been significantly decreased. We found good room temperature stability of the plasma hydrogenated ZnO nanocrystals in air, but fast degradation at elevated temperature\n
Characterization of hydrogenated silicon thin films and diode structures with integrated germanium nanoparticles
Stuchlík, Jiří ; Fajgar, Radek ; Kupčík, Jaroslav ; Remeš, Zdeněk ; Stuchlíková, The-Ha
Substrates with ZnO (or ITO) conductive layers were covered by thin film of a-Si:H deposited by PECVD technique. Under a turbo-molecular vacuum (10-4 Pa) the reactive laser ablation (RLA) was used to cover this a-Si:H thin film by germanium NPs. The RLA was performed using focused excimer ArF laser beam (193 nm, 100 mJ/pulse) under SiH4 background atmosphere (0.5 Pa). As a target the elemental germanium was used. Reaction between ablated Ge and silane led to formation of Ge NPs covered by thin SiGe layer. Then the deposited NPs were covered and stabilized by a-Si:H layer by PECVD. Those two deposition processes was alternated and applied a few times. The Si:H thin films with integrated Ge NPs were characterized by microscopic, spectroscopic and diffraction techniques. I-V characteristics of final diode structures without and under illumination were measured as well as their electroluminescence behaviour.
The hydrogen plasma doping of ZnO thin films and nanoparticles
Remeš, Zdeněk ; Neykova, Neda ; Potocký, Štěpán ; Chang, Yu-Ying ; Hsu, H.S.
The optical absorptance and photoluminescence studies has been applied on the hydrogen and oxygen plasma treated, nominally undoped ZnO thin films and aligned nanocolumns grown on the nucleated glass substrate by the hydrothermal process in an oil bath containing a flask with ZnO nutrient solution. The localized defect states at 2.3 eV below the optical absorption edge were detected by photothermal deflection spectroscopy (PDS) in a broad spectral range from near UV to near IR. The optical absorptance spectroscopy shows that hydrogen doping increases free electron concentration changing ZnO to be electrically conductive (hydrogen doping).\n
The deposition of amorphous and amorphous hydrogenated silicon with embedded cubic Mg.sub.2./sub.Si nanoparticles
Stuchlíková, The-Ha ; Stuchlík, Jiří ; Remeš, Zdeněk ; Fajgar, Radek ; Galkin, N.G. ; Galkin, K.N. ; Chernev, I.M.
We study possibilities how to increase a by usage of magnesium silicide nanoparticles (Mg2Si-NPs) in structure of Si: H. In this paper we introduce two technics -combination of PECVD and Vacuum Evaporation (VE) and Reactive Laser Ablation (RLA) -for preparation of cubic structure of Mg2Si-NPs in amorphous (a-Si) or amorphous hydrogenated (a-Si: H) silicon matrix. Formation of Mg2Si-NPs was proved by Raman spectroscopy. Likewise we introduce optical changes measured at absorption edge and the first results on realized NIP structures.
The deposition of germanium nanoparticles on hydrogenated amorphous silicon
Stuchlík, Jiří ; Volodin, V.A. ; Shklyaev, A.A. ; Stuchlíková, The-Ha ; Ledinský, Martin ; Čermák, Jan ; Kupčík, Jaroslav ; Fajgar, Radek ; Mortet, Vincent ; More Chevalier, Joris ; Ashcheulov, Petr ; Purkrt, Adam ; Remeš, Zdeněk
We reveal the mechanism of Ge nanoparticles (NPs) formation on the surface of the hydrogenated amorphous silicon (a-Si:H) deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) on ITO and a on boron doped nanocrystalline diamond (BDD). The coating of Ge NPs on a-Si:H was performed by molecular beam epitaxy (MBE) at temperatures up to 450 °C. The Ge NPs were characterized by Raman spectroscopy, scanning electron microscopy (SEM) and high resolution transmission electron microscopy (HRTEM). The nanocrystalline Ge particles are conglomerates of nanocrystals of size 10-15 nm and quantum dots (QDs) with size below 2 nm embedded in amorphous Ge phase. After coating with Ge NPs the a-Si:H thin films show better adhesion on BDD substrates then on ITO substrates.
Preparation of zinc oxide nanorods colloid from thin layers
Mičová, Júlia ; Remeš, Zdeněk ; Chang, Yu-Ying ; Neykova, Neda
The interest in ZnO (zinc oxide) nanoparticles is increasing due to low cost of their processing as well as the ability of fabricating ZnO nanostructures with controllable morphology such as size, shape and orientation. Our choice of method of the preparation of the nanostructured thin ZnO layers is the hydrothermal growth of ZnO nanorods on glass substrates coated by the nucleation layer deposited by the reactive magnetron sputtering. We have developed and optimized conditions of the thin layer growth with controllable dimensions of nanorods followed by the ultrasound peeling. The colloid of ZnO nanorods was characterized by measuring the size of particles using the dynamic light scattering (DLS) and the scanning electron microscopy (SEM). We found that the dynamic light scattering (DLS) can’t be directly used for size evaluation of ZnO nanorods due to their non- sperical shape. \n
Hydrogen plasma treatment of ZnO thin films
Chang, Yu-Ying ; Neykova, Neda ; Stuchlík, Jiří ; Purkrt, Adam ; Remeš, Zdeněk
ZnO is an attractive wide band gap semiconductor with large exciton binding energy, high refractive index, high biocompatibility and diversety of nanostructure shapes which makes it suitable for many applications in the optoelectronic devices, optical sensors, and biosensors. We study the effect of hydrogen plasma treatment of the nominally undoped ZnO thin film deposited by DC reactive magnetron sputtering of Zn target in the gas mixture of argon and oxygen plasma. The SEM images show that the crystal size increases with film thickness. We confirm, that the electrical conductivity significantly increases after hydrogen plasma treatment by 4 orders of magnitude. Moreover, the increase of the infrared optical absorption, related to free carrier concentration, was detected below the optical absorption edge by the photothermal deflection spectroscopy.\n

National Repository of Grey Literature : 28 records found   1 - 10nextend  jump to record:
See also: similar author names
Interested in being notified about new results for this query?
Subscribe to the RSS feed.