National Repository of Grey Literature 5 records found  Search took 0.00 seconds. 
Germanium and tin nanoparticles encapsulated in amorphous silicon matrix for optoelectronic application
Stuchlíková, The-Ha ; Remeš, Zdeněk ; Stuchlík, Jiří
The plasma enhanced chemical vapour deposition was combined with in situ deposition of Ge and Sn thin film by evaporation technique at surface temperature about 220 °C to form nanoparticles on the surface of hydrogenated silicon thin films to prepare diodes. Formation of nanoparticles was additionally stimulated by plasma treatment through a low pressure hydrogen glow discharge. The diodes based on PIN diode structures with and without the embedded Ge or Sn nanoparticles were characterized by temperature dependence of electrical conductivity, activation energy of conductivity, measurement of volt-ampere characteristics in dark and under solar illumination\n
Relation between optical and microscopic properties of hydrogenated silicon thin films with integrated germanium and tin nanoparticles
Stuchlík, Jiří ; Stuchlíková, The-Ha ; Čermák, Jan ; Kupčík, Jaroslav ; Fajgar, Radek ; Remeš, Zdeněk
The hydrogenated amorphous silicon layers (a-Si:H) were deposited by PECVD method on quartz substrates. During interruption of PECVD process the vacuum chamber was pumped up to 10-5 Pa and 1 nm thin films of Germanium or Tin were evaporated on the surface. The materials form isolated nanoparticles (NPs) on the a-Si:H surface. Then the deposited NPs were covered and stabilized by a-Si:H layer by PECVD. Those two deposition processes were alternated 5 times. The a-Si:H thin films with integrated Ge or Sn NPs were characterized optically by PDS and CPM methods, and microscopically by SEM and AFM microscopies. Optical and microscopic properties of the structures are correlated and discussed considering their application in photovoltaics.\n
Characterization of hydrogenated silicon thin films and diode structures with integrated germanium nanoparticles
Stuchlík, Jiří ; Fajgar, Radek ; Kupčík, Jaroslav ; Remeš, Zdeněk ; Stuchlíková, The-Ha
Substrates with ZnO (or ITO) conductive layers were covered by thin film of a-Si:H deposited by PECVD technique. Under a turbo-molecular vacuum (10-4 Pa) the reactive laser ablation (RLA) was used to cover this a-Si:H thin film by germanium NPs. The RLA was performed using focused excimer ArF laser beam (193 nm, 100 mJ/pulse) under SiH4 background atmosphere (0.5 Pa). As a target the elemental germanium was used. Reaction between ablated Ge and silane led to formation of Ge NPs covered by thin SiGe layer. Then the deposited NPs were covered and stabilized by a-Si:H layer by PECVD. Those two deposition processes was alternated and applied a few times. The Si:H thin films with integrated Ge NPs were characterized by microscopic, spectroscopic and diffraction techniques. I-V characteristics of final diode structures without and under illumination were measured as well as their electroluminescence behaviour.
The deposition of amorphous and amorphous hydrogenated silicon with embedded cubic Mg.sub.2./sub.Si nanoparticles
Stuchlíková, The-Ha ; Stuchlík, Jiří ; Remeš, Zdeněk ; Fajgar, Radek ; Galkin, N.G. ; Galkin, K.N. ; Chernev, I.M.
We study possibilities how to increase a by usage of magnesium silicide nanoparticles (Mg2Si-NPs) in structure of Si: H. In this paper we introduce two technics -combination of PECVD and Vacuum Evaporation (VE) and Reactive Laser Ablation (RLA) -for preparation of cubic structure of Mg2Si-NPs in amorphous (a-Si) or amorphous hydrogenated (a-Si: H) silicon matrix. Formation of Mg2Si-NPs was proved by Raman spectroscopy. Likewise we introduce optical changes measured at absorption edge and the first results on realized NIP structures.
The deposition of germanium nanoparticles on hydrogenated amorphous silicon
Stuchlík, Jiří ; Volodin, V.A. ; Shklyaev, A.A. ; Stuchlíková, The-Ha ; Ledinský, Martin ; Čermák, Jan ; Kupčík, Jaroslav ; Fajgar, Radek ; Mortet, Vincent ; More Chevalier, Joris ; Ashcheulov, Petr ; Purkrt, Adam ; Remeš, Zdeněk
We reveal the mechanism of Ge nanoparticles (NPs) formation on the surface of the hydrogenated amorphous silicon (a-Si:H) deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) on ITO and a on boron doped nanocrystalline diamond (BDD). The coating of Ge NPs on a-Si:H was performed by molecular beam epitaxy (MBE) at temperatures up to 450 °C. The Ge NPs were characterized by Raman spectroscopy, scanning electron microscopy (SEM) and high resolution transmission electron microscopy (HRTEM). The nanocrystalline Ge particles are conglomerates of nanocrystals of size 10-15 nm and quantum dots (QDs) with size below 2 nm embedded in amorphous Ge phase. After coating with Ge NPs the a-Si:H thin films show better adhesion on BDD substrates then on ITO substrates.

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7 Stuchlíková, Tereza
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