Národní úložiště šedé literatury Nalezeno 2 záznamů.  Hledání trvalo 0.01 vteřin. 
Growth and properties of diamond films prepared on 4-inch substrates by cavity plasma systems
Babčenko, Oleg ; Potocký, Štěpán ; Aubrechtová Dragounová, Kateřina ; Szabó, Ondrej ; Bergonzo, P. ; Rezek, B. ; Kromka, Alexander
We compare two microwave (2.45 GHz) plasma systems with ellipsoidal and multimode clamshell cavity for diamond synthesis by chemical vapor deposition. We use H2/CH4/CO2 gas mixture for diamond film deposition on Si <100> wafers. Both systems are capable of high pressure (up to 20 kPa) operation and high growth rates (several µm/h). We compare the cavity systems from the point of diamond quality (Raman shift measurement), substrate size (2” versus 4”) and grown film homogeneity together with surface morphology (SEM), deposition rate and parasitic doping levels (photoluminescence).
Plasma hydrogenation of hydrothermally grown ZnO micropods
Remeš, Zdeněk ; Aubrechtová Dragounová, Kateřina ; Mičová, J.
The hydrothermally grown ZnO micropods have been placed on grounded stainless-steel holder and exposed to an inductively coupled plasma (ICP) monitored in-situ by optical emission spectroscopy (OES). OES shows the immediate release of oxygen during Ar ion bombardment. The prolonged exposure to hydrogen plasma leads to deterioration of the optical properties as well. The exposure, rf power and hydrogen pressure have been optimized to enhance UV-photoluminescence peak at the wavelength 384 nm related to surface bounded excitons and reduce the defect-related photoluminescence in red spectral range. The strong UV photoluminescence appears just after 1 minute of plasma hydrogenation in a radio frequency plasma discharge with power density 40 W/dm3 and hydrogen pressure 17 Pa.

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