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Shaped E-beam nanopatterning with proximity effect correction
Urbánek, Michal ; Kolařík, Vladimír ; Matějka, Milan ; Matějka, František ; Bok, Jan ; Mikšík, P. ; Vašina, J.
Electron beam writer is a tool for writing patterns into a sensitive material (resist) in a high resolution. During the patterning, areas adjacent to the beam incidence point are exposed due to electron scattering effects in solid state (resist and the substrate). Consequently, this phenomenon, also called proximity effect, causes that the exposed pattern can be broader in comparison to the designed. In this contribution we present a software for proximity effect simulation and a software for proximity effect correction (PEC). The software is based on the model using the density of absorbed energy in resist layer and the model of resist development process. A simulation of proximity effect was carried out on binary lithography patterns, and consequently testing patterns were exposed with a corrected dose. As pattern generation, we used the e-beam writer TESLA BS 600 working with fixed energy 15keV and variable size rectangular shaped beam. The simulations of binary testing patterns and exposed patterns without PEC were compared. Finally, we compared the testing structures with PEC and without PEC, and we showed that the PEC tool works reliably for the e-beam writer BS 600.
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Calibration specimens for microscopy
Kolařík, Vladimír ; Matějka, Milan ; Matějka, František ; Krátký, Stanislav ; Urbánek, Michal ; Horáček, Miroslav ; Král, Stanislav ; Bok, Jan
Recent developments in nanotechnologies raised new issues in microscopy with nanometer and sub nanometer resolution. Together with the imaging techniques, new approaches in the metrology field are required both in the direct metrology issues and in the area of calibration of the imaging tools (microscopes). Scanning electron microscopy needs the calibration specimens for adjusting the size of the view field (correct magnification) and the shape of that field (correction of deflection field distortions). Calibration specimens have been prepared using different technologies; among them the e–beam patterning and the e–beam lithography have been proved to be appropriate and flexible tool for that task. In the past, we have reported several times our achievements in this field (e.g. [1]). Nevertheless, recent advances of the patterning tool (BS600), mainly the development of the technology zoomed exposure mode [2] and the installation of the magnetic field active cancellation system [3], pushed remarkably the technology necessary for further advances in this area. Within this contribution some theoretical, technology and practical aspects are discussed; achieved results are presented.
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Analysis of electron current instability in E-beam writer
Bok, Jan ; Horáček, Miroslav ; Král, Stanislav ; Kolařík, Vladimír ; Matějka, František
The electron beam writer Tesla BS600 works with a thermal-field electron emitter, fixed electron energy of 15 keV and a rectangular shaped variable-size electron beam. The size of the shaped beam (stamp) can be set from 50 to 6300 nm in standard mode and from 16 to 2100 nm in high-resolution mode. The basic increment of the stamp size is 50 nm, resp. 16 nm. Electron current density inhomogeneity and long-term instability in stamps can have negative impact on the exposure quality. Therefore, we focused on a study of the current time instability. The current density in variously sized stamps was measured by a picoammeter and a PIN diode video channel as a function of time. We analyzed short-term and long-term current instabilities using filtering techniques, as well as the Fourier analysis. Based on the results, we could be able to find reasons of the current instabilities and to propose improvements to achieve higher exposure quality.
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Current state and prospects of scintillation materials for detectors in SEM
Schauer, Petr ; Bok, Jan
The two principal quantities are important for assessing the quality of each imaging system. Firstly, it is the detective quantum efficiency (DQE), which is primarily a measure of image noise. As the DQE is determined by signal to noise ratio (SNR), the efficient and noise-free components are the key to the high DQE. Second, not less important indicator of image quality is also the modulation transfer function (MTF). MTF describes the ability of adjacent pixels to change from black to white in response to patterns of varying spatial frequency, and hence it determines the actual capability to show fine detail, whether with full or reduced contrast. Using a scanning imaging system the fast components are the key to the good MTF. In a scintillation electron detector of scanning electron microscope (SEM) the scintillator is the most crucial component, because it significantly influences both the DQE and MTF. The aim of this study is to assess the scintillation materials suitable for SEM detectors characterized by the both high efficiency and fast decay characteristic.
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What is the buzz about the TZ mode
Kolařík, Vladimír ; Matějka, František ; Matějka, Milan ; Horáček, Miroslav ; Urbánek, Michal ; Bok, Jan ; Krátký, Stanislav ; Král, Stanislav ; Mika, Filip
This contribution deals with an e-beam pattern generator BS 600 that works with a variable rectangular spot of electrons (stamp). The TZ stands for the ‘technology zoom’; its meaning is a reduction of the spot size by a factor of 3. Original description of the TZ exposure mode can be found in (1), [2] and [3]; further aspects concerning the exposure system and its electron source were described in [4] and [5]; technology and related topics are discussed in [6], [7], [8] and [9]; overview of application areas is in [10], [11] and [12]; and finally, very recent results are summarized in [13], [14] and [15].
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Quality assessment of scintillation detector in SEM using MFT
Bok, Jan ; Schauer, Petr
One of the recent trends in S(T)EM is increasing of the e-beam scanning speed. In general, higher speeds decrease object degradation and prevent image artifacts caused by slow electrical discharging. However, the increase of the scanning speed is limited by the time response of the segnal-electron detector. When the detector response is slower than the scanning speed, it can have negative influence to the quality of the scanned image, such as contrast reduction and image blurring. Usually, the rise and fall edges of the time response curve to a square electron pulse have more complex form, such as a multi-exponential function of time. Evaluate and compare the time-dependent edges in contex of their influence on the image quality is rather complicated. Therefore, we propose to express the detector time response by the modulation transfer function (MTF), which contains all relevant information. It can give the answer to the important question, what maximum scanning speed can be used not to significantly decrease the image quality.
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Measurements of current density distribution in e-beam writer
Bok, Jan ; Kolařík, Vladimír
An e-beam writer with a variable shaped beam needs a bright and stable source of electrons but also a homogeneous square beam segment. This is the starting element out oif wich smaller rectangular-shaped variable-sized patterns are selected (stamps). Current inhomogeneity of the starting element would cause and different current density of various stamps that negatively impacts the exposure quality. This problem implies the necessity of analysing and monitoring the current density distribution in the staring beam element.
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Issues of economical utilization of industrial monuments
Bok, Jan ; Kouba, Vojtěch (advisor) ; Hucková, Barbara (referee)
Thesis is focused on the phenomenon of industrial heritage. It deals with socio-cultural impact of industrialization on 19th century. It defines and classifies tangible evidence of those times. Supported by relevant literature it widens the knowledge of the theme of industrial heritage. Other main objective of the thesis is to define the concept of "industrial" in relation with arts and aesthetics of industrial heritage, proving the possibility of pure aesthetic contemplation by industrial themes and later applying of these findings in new economical use of abandoned structures. Apart from poll results there are also some photographs included which provide an insight on author's own aesthetic view on industrial heritage.
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