Original title: What is the buzz about the TZ mode
Authors: Kolařík, Vladimír ; Matějka, František ; Matějka, Milan ; Horáček, Miroslav ; Urbánek, Michal ; Bok, Jan ; Krátký, Stanislav ; Král, Stanislav ; Mika, Filip
Document type: Papers
Conference/Event: International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation /13./, Skalský dvůr (CZ), 2012-06-25 / 2012-06-29
Year: 2012
Language: eng
Abstract: This contribution deals with an e-beam pattern generator BS 600 that works with a variable rectangular spot of electrons (stamp). The TZ stands for the ‘technology zoom’; its meaning is a reduction of the spot size by a factor of 3. Original description of the TZ exposure mode can be found in (1), [2] and [3]; further aspects concerning the exposure system and its electron source were described in [4] and [5]; technology and related topics are discussed in [6], [7], [8] and [9]; overview of application areas is in [10], [11] and [12]; and finally, very recent results are summarized in [13], [14] and [15].
Keywords: e-beam lithography; variable shaped electron beam
Project no.: GA102/05/2325 (CEP), ED0017/01/01
Funding provider: GA ČR, GA MŠk
Host item entry: Proceedings of the 13th International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation, ISBN 978-80-87441-07-7

Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0215691

Permalink: http://www.nusl.cz/ntk/nusl-135995


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