Národní úložiště šedé literatury Nalezeno 27 záznamů.  začátekpředchozí18 - 27  přejít na záznam: Hledání trvalo 0.01 vteřin. 
Optimisation of Reliefs of Thin Polymer Films of Resist for Phase Diffractive Optical Elements
Matějka, František ; Matějková, Jiřina
Electron-beam lithography uses polymer electron resists mostly for recording of picture information. The behaviour of these polymer electron resists, under influence of the electron of the given energy, is expressed by the sensitivity curve. The curve of sensitivity is constructed as dependence of the relative change of thickness of the functional layer of resist, on the density of the absorbed energy.
Optimization of reliefs of thin polymer films of resist for phase diffractive optical elements
Matějka, František ; Matějková, Jiřina
Electron beam lithography uses polymer electron resists mostly for recording of picture information. The behaviour of these polymer electron resists, under influence of the electron of the given energy, is expressed by the sensitivity curve. The curve of sensitivity is constructed as dependence of the relative change of thickness of the functional layer of resist, on the density of the absorbed energy.
Test Specimens for SEM
Matějka, František ; Ryzí, Z.
In most applications SEM devices are utilized in the area of magnification quite far from the high limit. For such cases we prepare objects interesting for SEM by using special techniques of microfabrication. Those objects can be called test patterns. Compared with natural objects, they have an advantage: their geometry and dimensions are determined with high precision. Another advantage may be that the test pattern can be created from materials with well known properties. In our laboratories we prepare test specimens using electron-beam lithography and the anisotropic etching of silicon and using holographic techniques. We have designed the topography of anisotropically etched measuring test specimen ".mu.-scale".In most applications SEM devices are utilized in the area of magnification quite far from the high limit. For such cases we prepare objects interesting for SEM by using special techniques of microfabrication. Those objects can be called test patterns. Compared with natural objects, they have an advantage: their geometry and dimensions are determined with high precision. Another advantage may be that the test pattern can be created from materials with well known properties. In our laboratories we prepare test specimens using electron-beam lithography and the anisotropic etching of silicon and using holographic techniques. We have designed the topography of anisotropically etched measuring test specimen ".mu.-scale".

Národní úložiště šedé literatury : Nalezeno 27 záznamů.   začátekpředchozí18 - 27  přejít na záznam:
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12 Matějka, Filip
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