Original title: SMV-2018-04: Planární mikrostruktury pro optické aplikace
Translated title: SMV-2018-04: Planar microstructures for optical applications
Authors: Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav ; Fořt, Tomáš ; Oulehla, Jindřich ; Pokorný, Pavel
Document type: Research reports
Year: 2018
Language: cze
Abstract: [cze] [eng]

Keywords: e-beam lithography; optical density; photomask; reactive ion etching

Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0290382

Permalink: http://www.nusl.cz/ntk/nusl-390675


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Research > Institutes ASCR > Institute of Scientific Instruments
Reports > Research reports
 Record created 2019-01-07, last modified 2021-11-24


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