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Original title:
Variable-shape E-beam litography: Proximity effect simulation of 3D micro and nano sructures
Authors: Matějka, Milan ; Urbánek, M. ; Kolařík, V. ; Horáček, M. ; Krátký, Stanislav ; Mikšík, P. ; Vašina, J.
Document type: Papers
Conference/Event: NANOCON 2012. International Conference /4./, Brno (CZ), 2012-10-23 / 2012-10-25
Year: 2012
Language: eng
Abstract: A proximity effect simulation technique and developed resist profile simulation for variable-shaped e-beam lithography of three dimensional structures are presented. The e-beam lithography is a technology process which allows high resolution patterning. Most frequently it is used for microfabrication or nanofabrication of two dimensional relief structures such as resist photo masks, etching masks, diffraction gratings, micro and nano optics, photonics and more. However, in the case of the 3D structures patterning the precise thickness control of developed resist is required. With regard to subsequent proximity effect correction, the proximity effect simulation and developed resist profile simulation models are in the case of 3D structures fabrication critically important. We show the results from simulation of exposure and resist development process for the chosen polymer resist (PMMA), using the patterning and simulation e-beam lithography software.
Keywords: 3D resist structures; development process simulation; polymer resist; proximity effect simulation and correction; variable shape electron beam lithography
Project no.: FR-TI1/576 (CEP), ED0017/01/01, TE01020233 (CEP)
Funding provider: GA MPO, GA MŠk, GA TA ČR
Host item entry: NANOCON 2012, 4th International Conference Proceedings, ISBN 978-80-87294-32-1
Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0219947
Permalink: http://www.nusl.cz/ntk/nusl-151689
The record appears in these collections:
Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers
Authors: Matějka, Milan ; Urbánek, M. ; Kolařík, V. ; Horáček, M. ; Krátký, Stanislav ; Mikšík, P. ; Vašina, J.
Document type: Papers
Conference/Event: NANOCON 2012. International Conference /4./, Brno (CZ), 2012-10-23 / 2012-10-25
Year: 2012
Language: eng
Abstract: A proximity effect simulation technique and developed resist profile simulation for variable-shaped e-beam lithography of three dimensional structures are presented. The e-beam lithography is a technology process which allows high resolution patterning. Most frequently it is used for microfabrication or nanofabrication of two dimensional relief structures such as resist photo masks, etching masks, diffraction gratings, micro and nano optics, photonics and more. However, in the case of the 3D structures patterning the precise thickness control of developed resist is required. With regard to subsequent proximity effect correction, the proximity effect simulation and developed resist profile simulation models are in the case of 3D structures fabrication critically important. We show the results from simulation of exposure and resist development process for the chosen polymer resist (PMMA), using the patterning and simulation e-beam lithography software.
Keywords: 3D resist structures; development process simulation; polymer resist; proximity effect simulation and correction; variable shape electron beam lithography
Project no.: FR-TI1/576 (CEP), ED0017/01/01, TE01020233 (CEP)
Funding provider: GA MPO, GA MŠk, GA TA ČR
Host item entry: NANOCON 2012, 4th International Conference Proceedings, ISBN 978-80-87294-32-1
Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0219947
Permalink: http://www.nusl.cz/ntk/nusl-151689
The record appears in these collections:
Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers
Record created 2013-03-20, last modified 2021-11-24