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SMV-2018-04: Planar microstructures for optical applications
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav ; Fořt, Tomáš ; Oulehla, Jindřich ; Pokorný, Pavel
The development of planar microstructures for optical applications, and subsequent realization of samples by the way of e-beam lithography and other techniques. Project deals with material study suited for the fabrication of planar microstructures in thin metallic layer with respect to achievable resolution and fulfilling the absorbance parameters for particular application. E-beam lithography is used for preparation the motif in resist layer, which is masking layer for the etching of metallic layer by various techniques (wet etching, reactive ion etching). Technical documentation of developed processes and prepared samples are also the part of the project.
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SMV-2018-02: Analysis of planar microstructures prepared by compound writing method
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development of materials, techniques and methodology for planar microstructures preparatio. Preparation and evaluation of a thin layers for planar microstructures making, analysis of microstructures using scanning electron microscopy and confocal microscopy, preparation of the masks for compound exposures by means of electron beam lithography, utiilization of UV mask aligner, RIE, etc., verification of the proposed methodology, evaluation of the final parameters.\n\n
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SMV-2018-01: Relief structures based on diffractive optics
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of graphic and optical structures based on the principle of diffractive optics by means of electron beam lithography in a recording material supported by a silicon or glass board. The research covers the analysis of the graphical or optical motive, research and application of relief structures implementing the required graphic and optical properties, research and modeling of the physical possibilities of implementation of relief structures, preparation and analysis of technology of implementation of relief structures with regard to the limits of current scientific instruments, verification of theoretical considerations by means of relief structure sample exposure.
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Creation of electron vortex beams using the holographic reconstruction method in a scanning electron microscope
Řiháček, Tomáš ; Horák, M. ; Schachinger, T. ; Matějka, Milan ; Mika, Filip ; Müllerová, Ilona
Electron vortex beams (EVB) were theoretically predicted in 2007 and first experimentally\ncreated in 2010. Although they attracted attention of many researchers, their\ninvestigation takes place almost solely in connection with transmission electron microscopes (TEM). On the other hand, although scanning electron microscopes (SEM) may provide some advantages for EVB applications, only little attention has been dedicated to them. Therefore, the aim of this work is to create electron vortices in SEM at energies of several keV.
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Hiding e-beam exposure fields by deterministic 2D pattering
Horáček, Miroslav ; Knápek, Alexandr ; Matějka, Milan ; Krátký, Stanislav ; Urbánek, M. ; Mika, Filip ; Kolařík, Vladimír
The high stability and good current homogeneity in the spot of the e-beam writer is crucial to\nthe exposure quality, particularly in the case of large-area structures when gray-scale\nlithography is used. Even though the deflection field distortion is calibrated regularly and\nbeam focus and beam astigmatism is dynamically corrected over the entire deflection field, we can observe disturbances in the exposed relief.\nRecently, we presented a method that makes use of e–beam exposure imperfection by\nintroducing marginally visible high–frequency diffraction gratings of variable pitch that fill in\nseparate orthogonal exposure fields. The actually presented approach follows up our\nresearch on aperiodic arrangements of optical primitives, especially on the phyllotactic–\nlike arrangement of sub–micron relief optical elements. This approach is extended from the\ndiffraction element arrangement to the higher level of exposure fields arrangements.
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Lift-off technology for thick metallic microstructures
Krátký, Stanislav ; Horáček, Miroslav ; Meluzín, Petr ; Kolařík, Vladimír ; Matějka, Milan ; Oulehla, Jindřich ; Pesic, Z.
This paper deals with a method enabling the preparation of thick metallic microstructures on metal substrates. Such metallic microstructures can be used as a resolution samples to characterize various microanalysis techniques, such as X-ray fluorescence (XRF) or X-ray photoelectron spectroscopy (XPS). Moreover, the\npatterned samples could be used as anodes to characterize focusing properties of X-ray tubes for micro CT systems. Considering that the standard lift-off technique is designated for structures with the thickness of several hundred nanometers at most, we had to modify lift-off technique to be possible to use it for preparation of very thick metal layers (several microns) with spatial resolution of a few microns. The mask with the desired pattern for UV exposure was prepared by e-beam lithography. SU-8 photoresist was used for a lift-off because of its aspect ratio ability, process purity and high resistance to heating. We used a thin layer of PMMA under the SU-8 masking layer to guarantee the photoresist would lift-off correctly. Thick aluminum layer was deposited by thermal evaporation. The dependence of metal layer thickness as a function of required exposed\nline width was determined. The final lift-off process was carried out in acetone ultrasonic bath. Generally, this technology can be used for the evaporate deposition of various materials with several microns thick layer in\nmicron resolution.
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SMV-2017-27: Characterization of samples with thin layers
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Development in the field of planar microstructures for optical applications, physical realization of structures by means of electron beam lithography and characterization of the samples. The project covers the processing and analysis of the graphical motive, research and application of planar microstructures performing required properties, research and modeling of the physical possibilities of implementation of microstructures, regard to the limits of current scientific instruments in our laboratory, data preparation for e-beam lithography exposure, samples exposure, verification of properties of samples and technical documentation preparation.
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Briccius Gauske of Görlitz in the context of stone-sculpture of the last third of the 15th century
Matějka, Milan ; Ottová, Michaela (advisor) ; Macek, Petr (referee)
This master thesis is focused on Briccius Gauzske, stone-scupturer od late 15th century. That was tracked in the archives in Görlitz, Wroclaw and Kutná Hora. It deals with the oeuvre subscipted to the artist by various art-historians of the 20th century (Kurt Bimler 1941, Mieczyslaw Zlat 1958, Eva Matějková 1962) that was critisised by Michaela Ottová (2007) later on. By catalogization of subsripted art-works (Frauentor in Görlitz, Nikolaitor and Rathaus in Wroclaw, St. Barbaras Church in Kutná Hora and so on.) Subsequently the catalogue part I was driven to believe that the early- hypotesis by the previous art-historians is relevant and Master Briccius was leader of the workshop shaping the apperance of Wroclaw and Kutná Hora. Than follows minor chapter about his stylistic origins that leads us to Jörg Syrlin sn. Workshop in Ulm, as was already said in literature (Michaela Ottová 2007)
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