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SMV-2018-01: Relief structures based on diffractive optics
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of graphic and optical structures based on the principle of diffractive optics by means of electron beam lithography in a recording material supported by a silicon or glass board. The research covers the analysis of the graphical or optical motive, research and application of relief structures implementing the required graphic and optical properties, research and modeling of the physical possibilities of implementation of relief structures, preparation and analysis of technology of implementation of relief structures with regard to the limits of current scientific instruments, verification of theoretical considerations by means of relief structure sample exposure.
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Secondary electron hyper spectral imaging in helios nanolab - mapping materials properties or artefacts?
Rodenburg, C. ; Masters, R. ; Abrams, K. ; Dapor, M. ; Krátký, Stanislav ; Mika, Filip
A link between peaks in secondary electron (SE) spectra and Electron Energy Loss Spectra\n(EELS) was shown decades ago. Also, materials properties (bulk modulus, band gap)\ncorrelate with the bulk plasmon position in EELS, and local modulus maps in carbon fibres\nhave been presented. If any features as result of plasmon decay into SE can be identified,\nSE spectroscopy combined with hyperspectral imaging could transform the SEM into a tool\nfor mapping materials properties with ground-breaking potential for nanotechnology. To\nbecome a reality, we first need to establish SE collection conditions spectra that represent a\nmaterial reliably. Second, we need to gain a better understanding of the processes involved in the SE emission processes.
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Hiding e-beam exposure fields by deterministic 2D pattering
Horáček, Miroslav ; Knápek, Alexandr ; Matějka, Milan ; Krátký, Stanislav ; Urbánek, M. ; Mika, Filip ; Kolařík, Vladimír
The high stability and good current homogeneity in the spot of the e-beam writer is crucial to\nthe exposure quality, particularly in the case of large-area structures when gray-scale\nlithography is used. Even though the deflection field distortion is calibrated regularly and\nbeam focus and beam astigmatism is dynamically corrected over the entire deflection field, we can observe disturbances in the exposed relief.\nRecently, we presented a method that makes use of e–beam exposure imperfection by\nintroducing marginally visible high–frequency diffraction gratings of variable pitch that fill in\nseparate orthogonal exposure fields. The actually presented approach follows up our\nresearch on aperiodic arrangements of optical primitives, especially on the phyllotactic–\nlike arrangement of sub–micron relief optical elements. This approach is extended from the\ndiffraction element arrangement to the higher level of exposure fields arrangements.
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Lift-off technology for thick metallic microstructures
Krátký, Stanislav ; Horáček, Miroslav ; Meluzín, Petr ; Kolařík, Vladimír ; Matějka, Milan ; Oulehla, Jindřich ; Pesic, Z.
This paper deals with a method enabling the preparation of thick metallic microstructures on metal substrates. Such metallic microstructures can be used as a resolution samples to characterize various microanalysis techniques, such as X-ray fluorescence (XRF) or X-ray photoelectron spectroscopy (XPS). Moreover, the\npatterned samples could be used as anodes to characterize focusing properties of X-ray tubes for micro CT systems. Considering that the standard lift-off technique is designated for structures with the thickness of several hundred nanometers at most, we had to modify lift-off technique to be possible to use it for preparation of very thick metal layers (several microns) with spatial resolution of a few microns. The mask with the desired pattern for UV exposure was prepared by e-beam lithography. SU-8 photoresist was used for a lift-off because of its aspect ratio ability, process purity and high resistance to heating. We used a thin layer of PMMA under the SU-8 masking layer to guarantee the photoresist would lift-off correctly. Thick aluminum layer was deposited by thermal evaporation. The dependence of metal layer thickness as a function of required exposed\nline width was determined. The final lift-off process was carried out in acetone ultrasonic bath. Generally, this technology can be used for the evaporate deposition of various materials with several microns thick layer in\nmicron resolution.
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SMV-2017-27: Characterization of samples with thin layers
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Development in the field of planar microstructures for optical applications, physical realization of structures by means of electron beam lithography and characterization of the samples. The project covers the processing and analysis of the graphical motive, research and application of planar microstructures performing required properties, research and modeling of the physical possibilities of implementation of microstructures, regard to the limits of current scientific instruments in our laboratory, data preparation for e-beam lithography exposure, samples exposure, verification of properties of samples and technical documentation preparation.
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Deterministic Aperiodic Image Device
Horáček, Miroslav ; Meluzín, Petr ; Krátký, Stanislav ; Knápek, Alexandr ; Mika, Filip ; Chlumská, Jana ; Matějka, František ; Král, Stanislav ; Brunn, Ondřej ; Giričová, D. ; Kopal, Jaroslav ; Kolařík, Vladimír
The paper deals with the analysis, design and preparation of a diffractive optically variable imaging device consisting of a deterministic aperiodic mesh formed by basic optical elements. The theoretical basis is complemented by numerical analysis and presentation of the implemented master and its replicas.
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SMV-2017-04: Electron beam lithography technology development
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of graphic and optical structures based on the principle of diffractive optics by means of electron beam lithography in a recording material supported by a silicon or glass board. The research covers the analysis of the graphical or optical motive, research and application of relief structures implementing the required graphic and optical properties, research and modeling of the physical possibilities of implementation of relief structures, preparation and analysis of technology of implementation of relief structures with regard to the limits of current scientific instruments, verification of theoretical considerations by means of relief structure sample exposure.
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