|
|
Submicron Structures with Deep Relief — Technology of Preparation
Matějka, Milan ; Kuřitka,, Ivo (referee) ; Mgr. Petr Klapetek Ph.D (referee) ; Kolařík, Vladimír (advisor)
The dissertation thesis is focused on research and development in the field of microfabrication by the technology of electron beam lithography. In the first part of this work, the extensive study is conducted in the field of technology of electron beam lithography in terms of physical principles, writing strategies and resist materials. This is followed with description of physical principles of etching for the transfer of relief structures into substrates. The thesis describes innovative techniques in modelling, simulation, data preparation and optimization of manufacturing technology. It brings new possibilities to record deep binary or multilevel microstructures using electron beam lithography, plasma and reactive ion etching technology. Experience and knowledge in the large area of microlithography, plasma and anisotropic wet-etching of silicon have been capitalized to the design process of manufacturing of nano-patterned membranes. It was followed with practical verification and optimization of the microfabrication process.
|
|
|
Design and set up of a laboratory sample of a laser deflectometer for measurement of mechanical stress within thin films
Šustek, Štěpán ; Klapetek,, Petr (referee) ; Ohlídal, Miloslav (advisor)
This diploma thesis describes the design of a device for measuring stress in thin films – laser deflectometer, realization of its design and its experimental testing. The thesis is divided into five chapters. The first chapter deals with the stress in thin films and its influence on substrate – thin film system. The second chapter provides an overview of devices widely used for measuring stress in thin films and describes some their advantages and disadvantages. In the third chapter some design possibilities of the device are presented. The final solution of device called deflectometr is introduced in the fourth chapter. The last chapter includes the functional testing the device.
|
|
|
Surface topography and mechanical properties of thin films on tetravinylsilane basis
Plichta, Tomáš ; Klapetek, Petr (referee) ; Čech, Vladimír (advisor)
Proposed diploma thesis is focused on preparation and characterization of the plasma polymer thin films based on tetravinylsilane monomer (TVS). Plasma enhanced chemical vapour deposition (PECVD) method involving pulse and continual plasma discharge modes were used for thin film deposition on silicon wafer pieces. Reactive plasma composition was containing pure TVS or mixtures of TVS and argon or oxygen gas. Atomic force microscopy was used for surface topography and roughness characterization. Cyclic nanoindentation was involved to measurements to determine the Young’s modulus and hardness of prepared films and scratch test was performed to evaluate the degree of adhesion. Special attention was drawn to the characterization of films with a Young’s modulus below 10 GPa. Tip geometry of indenter influence on scratch test was also commented. Surface and mechanical properties of thin films in relation to the deposition conditions were correlated to the obtained results and final analysis of deposition conditions influence is proposed.
|
|
|
Application of Interferometry in VT UHV SPM
Šulc, Dalibor ; Klapetek, Petr (referee) ; Fejfar, Antonín (referee) ; Spousta, Jiří (advisor)
The thesis is aimed at the development of Scanning Probe Microscopes (SPM). It describes design and development of modular controll electronics to be applied eectively on more microscopes SPM. Control electronics consist of stabilized power source, high–voltage amplier and probe signal amplier. The open–source project GXSM has been introduced. It contains a logic control unit which controls scanning, acquiring data and feedback control. GXSM provides a graphical user interface based on linux operation system. Second part of the thesis is aimed at design and development of interferometric deection sensing system for SPM cantilevers and applications at SPM in general. Designed interferometer has been assembled and tested. It can clearly distinguish a signal of amplitude 2 nm. At the end of the thesis the design of interferometric system implementation is presented.
|
|
|
Design of Low-Temperature Ultra High Vacuum Scanning Probe Microscopes
Pavera, Michal ; Klapetek, Petr (referee) ; Vetushka, Aliaksei (referee) ; Šikola, Tomáš (advisor)
This thesis deals with the development of scanning probe microscopes. Mechanical requirements for microscopes using measuring methods of scanning tunneling microscopy (STM) and atomic force microscopy (AFM) under enviroments of an ultrahigh vacuum (UHV) and variable temperatures are specified. Mechanical designs of two microscopes are discussed and their control electronics described. A special chapter is devoted to description of linear piezo manipulators and mechanical design of these prototypes.
|
|
|
Manufacturing of Relief Diffractive Structures for Optical Elements Using Electron Beam Lithograph
Daněk, Lukáš ; Urban, František (referee) ; Klapetek,, Petr (referee) ; Kolařík, Vladimír (advisor)
This thesis describes several techniques for the optimization of the manufacturing of relief diffractive structures used as optical elements by Electron beam lithograph BS600 in the Electron beam laboratory of the Institute of Scientific Instruments of the Academy of Sciences of the Czech Republic. The Electron beam lithograph BS600 was originally developed and constructed in the Institute of Scientific Instruments of the Academy of Sciences of the Czech Republic for Tesla in 1983, but is still developing, which was published. The Electron been lithograph BS600 is specific in these days because of its accelerating potential and is unique in the world because of the possibility to shape the beam. The optimization of manufacturing of relief diffractive structures, used as optical elements, was mostly reached by analysis, bringing optimal solution for the required effect. Moreover, an algorithm was developed for driving the electron beam position, shape, size and the time of each elementary exposition. The analysis showed that is convenient to use mathematical description of separate lines of diffractive structures. A separate subject was carried out for the calibration of the exposition field of the Electron beam lithograph BS600.
|
|
|
Surface and Mechanical Properties of Thin Films
Pálesch, Erik ; Klapetek, Petr (referee) ; Skuhurov,, Andrey (referee) ; Čech, Vladimír (advisor)
The doctoral thesis deals with the study of morphology and mechanical properties of thin plasma polymer films based on tetravinylsilane monomer and its mixtures with oxygen and argon. Thin films were prepared by plasma-enhanced chemical vapour deposition on silicon and glass substrates. Atomic force microscopy was used for characterization of thin film surface and for depiction of composite interphase with functional interlayer. Mechanical properties of thin films, namely Young’s modulus and hardness, were studied by cyclic nanoindentation technique. Nanoindentation device was also used to carry out scratch test, which was helpful to describe adhesion of films to substrate. In this thesis the influence of deposition conditions on surface and mechanical properties of thin films prepared in continual and pulse wave on planar substrates is discussed. Also, the suitability of few atomic force microscopy techniques for depiction of composite interphase was reviewed.
|
|
|
Study of Thin-Film Surfaces
Trivedi, Rutul Rajendra ; Fejfar, Antonín (referee) ; Klapetek, Petr (referee) ; Šikola, Tomáš (referee) ; Čech, Vladimír (advisor)
Disertační práce se zabývá studiem povrchových vlastností jedno a vícevrstvých filmů deponovaných z vinyltriethoxysilanových a tetravinylsilanových monomerů. Zabývá se také charakterizací adheze jednovrstvých filmů z tetravinylsilanu. Plazmaticky polymerizované tenké vrstvy byly připraveny na leštěných křemíkových substrátech pomocí plazmové depozice z plynné fáze za ustálených podmínek. Povrchové vlastnosti vrstev byly charakterizovány pomocí různých metod rastrovací sondové mikroskopie a nanoindentačních technik jako je konvenční a cyklická nanoindentace. Vrypový test byl použit pro charakterizaci vlastností adheze vrstev. Jednovrstvé filmy připravené za různých depozičních podmínek byly charakterizovány s ohledem na povrchové morfologie a mechanické vlastností (modul pružnosti, tvrdost). Výsledky morfologie povrchu, analýzy zrn, nanoindentace, analýzy konečných prvků a modulů mapování pomohly rozlišit hybridní charakter filmů, které byly deponovány při vyšších výkonech RF-výboje. Nový přístup byl použit v povrchové charakterizaci vícevrstvého filmu pomocí rastrovací sondové mikroskopie a nanoindentace. Adhezívní chování plazmaticky polymerizovaných vrstev různých mechanických vlastností a tloušťek bylo analyzováno pomocí normálních a laterálních síl, koeficientu tření, a snímků vrypů získaných pomocí mikroskopie atomárních sil.
|
|
|
Surface analysis of xGnP/PEI nanocomposite
Červenka, Jiří ; Klapetek, Petr (referee) ; Čech, Vladimír (advisor)
Tato Diplomová práce se zabývá povrchovou analýzou nanokompozitní folie polyetherimidu (PEI) vyztuženého exfoliovanými grafitickými nanodestičkami (xGnP). Analyzovány byly take vzorky nevyztužené PEI folie a samostatné nanodestičky. Vzorky nanokompozitu a PEI folie byly plazmaticky leptány s využitím argonového plazmatu po dobu 1, 3 a 10 hod. Skenovací elektronová mikroskopie (SEM) byla použita pro charakterizaci samostatných nanodestiček rozptýlených na křemíkovém substrátu, původních či leptaných vzorků PEI folie a nanokompozitu. Nanodestičky byly identifikovány při povrchu leptané nanokompozitní folie. Mikroskopie atomárních sil (AFM) byla použita pro zobrazení povrchové topografie separovaných nanodestiček a odkrytých destiček při povrchu leptaného kompozitu. Povrchová drsnost (střední kvadratická hodnota, vzdálenost nejnižšího a nejvyššího bodu) leptaného nanokompozitu narůstala s prodlužující se dobou leptání. Akustická mikroskopie atomárních sil (AFAM) byla použita pro charakterizaci elastické anizotropie leptaných kompozitních vzorků. Nanoindentační měření umožnila charakterizaci lokálních mechanických vlastností PEI a nanokompozitních folií.
|
|
|
Adhesion characterization of thin plasma-polymer films
Pálesch, Erik ; Klapetek, Petr (referee) ; Čech, Vladimír (advisor)
The diploma thesis deals with characterization of adhesion of plasma polymer films deposited on silicon wafers. The samples included organosilicon thin films based on tetravinylsilane monomer prepared by plasma-enhanced chemical vapour deposition. Scratch test was used to characterize film adhesion employing nanoindentation measurements. Adhesion of plasma polymer films of different mechanical properties and film thickness was analyzed by normal and lateral forces, friction coefficient, and scratch images obtained by scanning probe microscope working in atomic force microscopy mode.
|
guest ::
RSS feed.