National Repository of Grey Literature 156 records found  1 - 10nextend  jump to record: Search took 0.01 seconds. 
Effect of substrate and geometry on the size of the anomalous Nernst phenomenon
Golub, Dmitrii ; Zázvorka,, Jakub (referee) ; Čech, Vladimír (advisor)
Anomální Nernstův jev se týká vzniku příčného napětí v magnetických materiálech při aplikovaném podélném teplotním gradientu. Tento jev slibuje aplikace v oblasti spinové kaloritroniky a zlepšené konverze tepelné energie. Zde jsme zkoumali vliv substrátu vzorku a experimentální geometrie na anomální Nernstův jev ve vzorcích tenkých filmů permaloye napařených na substrátech. Provedli jsme studii anomálního Nernstova jevu na vzorcích s čtyřmi různými substráty s podstatně odlišnou tepelnou vodivostí. Kromě toho jsme testovali čtyři různé techniky generování teplotního gradientu ve vzorcích: tři metody pro generování gradientu v rovině a jednu metodu pro generování gradientu mimo rovinu. Pozorujeme, že tepelná vodivost substrátu významně ovlivňuje velikost teplotního gradientu. V dvou konfiguracích v rovině jsme naměřili konzistentní koeficient anomálního Nernstova jevu, gradient teploty mimo rovinu byl odhadnut na základě získaných dat.
Study of low-temperature plasma products using mass spectrometry and their relation to thin film chemistry
Maršálek, Blahoslav ; Bránecký, Martin (referee) ; Čech, Vladimír (advisor)
The aim of this thesis was to analyse and interpret the spectra of tetravinylsilane as a function of plasma discharge power in order to find a relationship between plasma products, layer deposition and thin film chemistry. Another objective was to carry out a literature search in the field of plasma-enhanced chemical vapour deposition (PECVD) and mass spectrometry. Low temperature organosilicate-based plasma technology enables the synthesis of specific materials with controlled chemical and physical properties. The targeted synthesis of surfaces with controlled properties is determined by the atomic and molecular processes in the plasma, which are responsible for building the chemical structure and the resulting material in the form of a thin film. In this work, mass spectrometry has been used to detect and quantify the particles produced in the PECVD process, which is one of the methods that allow the characterization and identification of plasma products. Analysis of the mass spectra revealed that the molecules responsible for the growth of the layer contain carbon and silicon. The deposition rate determined by in situ spectroscopic ellipsometry correlates quantitatively with the flux of carbon and silicon particles that are chemisorbed on the film surface. The ratio of carbon and silicon deposited on the surface also correlates strongly with the C/Si flux ratio of the power driven plasmas. The contribution of silicon-containing particles as building blocks to the film growth decreases with increasing power and accounts for 20% (2 W), 5% (10 W) and only 1% (75 W) of the total chemisorbed fraction. This ratio between bound silicon containing particles and carbon particles affects the elemental composition and chemical structure of the deposited layers. The relationships between plasmachemical processes and particle adhesion on the surface are quite complex. The adhesion of silicon particles first increases sharply to a maximum at 25 W and then gradually decreases, which is characteristic of the so-called precursor-deficient PECVD. Similarly, the concentration of vinyl groups incorporated into the deposited layer and the fraction of sp2 hybridization of carbon correlate with the particle fluxes of the corresponding plasma. This work has demonstrated that mass spectroscopy is a suitable method for the study of plasmachemical deposition from the gas phase (PECVD). PECVD technology is promising for the deposition of silicon-containing layers, which is technologically applicable in many directions of materials research.
Surface and mechanical properties of a-CSi:H and a-CSiO:H films
Plichta, Tomáš ; Shukurov, Andrey (referee) ; Klapetek, Petr (referee) ; Čech, Vladimír (advisor)
The dissertation thesis deals with the preparation and characterisation of a-CSi:H and a CSiO:H thin films prepared using the process of plasma enhanced chemical vapour deposition (PECVD). Tetravinylsilane (TVS) and its mixtures with argon and oxygen were used to deposit films on both planar substrates and fibre bundles. Main characterisation techniques were employed to study the topography of films, namely atomic force microscopy (AFM). Their mechanical properties were studied through nanoindentation; the nanoscratch test was used to assess the film adhesion to the substrate. Other analysed properties were internal stress and friction coefficient. The particular attention was paid to the work of adhesion and its determination. This knowledge was further applied to the preparation of surface treatments of glass fibres and, subsequently, polymer composites. Those were tested using the push-out test and the short beam shear test. Based on the results, the effects of deposition conditions and the relationships between the studied properties and quantities were determined.
Mechanical response of glass fiber-reinforced polymer composite
Širjovová, Veronika ; Svěrák, Tomáš (referee) ; Čech, Vladimír (advisor)
The bachelor thesis is concerned with mechanical properties of glass fiber-reinforced polymer composites depending on the surface modification of fibers and the volume fraction of fibers in the composite. The tested samples in a form of composite beams were consisted of polyester matrix reinforced with long glass fibers without surface treatment (unsized) and with commercial sizing. Shear and flexural tests were employed to evaluate adhesion at the fiber-matrix interface. The theoretical part focuses on literary search for composites, their components (matrix, reinforcement, interphase) and methods of testing their mechanical properties. The experimental part describes used materials, procedures and methods. In the result part, an assessment of the influence of the given conditions on the shear and flexural strength of the composite is summarized.
Development and Application of an UHV Equipment for Deposition of Thin Films (Atomic and Ion Systems)
Mach, Jindřich ; Čech, Vladimír (referee) ; Lencová, Bohumila (referee) ; Šikola, Tomáš (advisor)
In the thesis the development of two equipment for preparation of ultrathin films under ultrahign vacuum conditions (UHV) is discussed. Here, additionally to a brief description of theoretical principles, more details on the design of these units are given. In the first part the design of a thermal source of oxygen or hydrogen atomic beams is discussed. Further, a design and construction of an ion–atomic beam source for ion-beam assisted deposition of thin films is detailed. The source combines the principles of an efusion cell and electron-impact ion beam source generating ions of (30 – 100) eV energy. The source has been successfully applied for the growth of GaN on the Si(111) 7x7 substrate under room temperature.
Simultaneous measurement of surface pontetial and transport response of graphene Hall bars
Štrba, Lukáš ; Čech, Vladimír (referee) ; Bartošík, Miroslav (advisor)
Graphene is a semimetal with zero band gap. Position of Fermi level can be changed by applied gate voltage, which results in a change of free carier concentration. This work focuses on a simultaneous measurement of surface potential by Kelvin probe force microscopy (KPFM) and transport response of graphene Hall bars in different relative humidities and with applying gate voltage. The transport response was also observed in case of graphene Hall bar structure modified by local anodic oxidation (LAO).
Surface modification of glass fibers for polymer composites
Knob, Antonín ; Marek,, Aleš (referee) ; Burša, Jiří (referee) ; Čech, Vladimír (advisor)
The doctoral thesis is aimed at preparation of glass fiber reinforced polymer composites with controlled interphase formed by plasma-polymerized tetravinylsilane and tetravinylsilane/oxygen thin films. The thin polymer films of specific physico-chemical properties and thickness were deposited to improve interfacial adhesion of glass fiber/polyester composites. The fiber surface modification was performed by using plasma enhanced chemical vapor deposition in low-temperature RF plasma operating in an various effective power range and different treatment time. Test results were examined in relation to the interlayer thickness and different treatment conditions. The prepared interlayers were analyzed to evaluate physico-chemical composition and properties (XPS, RBS, ERDA, FTIR and spectroscopic elipsometry). Selected mechanical properties were evaluated by AFM. Mechanical response of plasma interlayers was evaluated by short beam shear test and direct method of testing the interfacial shear strength using microindentation. The interphase shear failure was controlled by the shear strength at the interlayer/fiber interface as follows from experimental and model data.
Adhesion characterization of thin plasma-polymer films
Pálesch, Erik ; Klapetek, Petr (referee) ; Čech, Vladimír (advisor)
The diploma thesis deals with characterization of adhesion of plasma polymer films deposited on silicon wafers. The samples included organosilicon thin films based on tetravinylsilane monomer prepared by plasma-enhanced chemical vapour deposition. Scratch test was used to characterize film adhesion employing nanoindentation measurements. Adhesion of plasma polymer films of different mechanical properties and film thickness was analyzed by normal and lateral forces, friction coefficient, and scratch images obtained by scanning probe microscope working in atomic force microscopy mode.
Surface modification of glass fibers using plasma nanotechnology
Sedlák, Filip ; Knob, Antonín (referee) ; Čech, Vladimír (advisor)
Diploma thesis is aimed at deposition of thin films on glass fibers using plasma-enhanced chemical vapor deposition from tetravinylsilane as a monomer. Such surface modified glass fibers were used as reinforcements for fabrication of polymer composites with unsaturated polyester resin as a matrix. Chemical and optical properties of prepared thin films were characterized using infared spectroscopy and spectroscopic ellipsometry. An influence of deposited thin films on the shear strength of composite material was observed using short-beam shear test.
Thin films prepared in RF glow discharge and their physico-chemical properties
Bránecký, Martin ; Boušek, Jaroslav (referee) ; Čech, Vladimír (advisor)
Theoretical part of this master thesis was focused on literature recherché dealing with the formation of thin films, plasma, plasma analyses using mass spectrometry and plasma polymerization. Further, this section describes the analysis of thin films using optical methods such as spectroscopic ellipsometry and FT-IR spectrometry. Experimental part describes the materials which are used for the preparation of thin films as well as a description of the equipment for preparation of thin films using a technology of plasma-enhanced chemical vapor deposition (PE-CVD). Control of deposition conditions and monitoring of plasma with its products result in high reproducibility of thin films. The last part of the thesis describes the results of measurement of the first group of samples and their ellipsometric, mass spectrometry and FT-IR evaluation with respect to the deposition conditions.

National Repository of Grey Literature : 156 records found   1 - 10nextend  jump to record:
See also: similar author names
1 Čech, Viktor
3 Čech, Vlastimil
8 Čech, Vojtěch
2 Čech, Vratislav
2 Čech, Václav
1 Čech, Vít
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