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Study of Thin-Film Surfaces
Trivedi, Rutul Rajendra ; Fejfar, Antonín (oponent) ; Klapetek, Petr (oponent) ; Šikola, Tomáš (oponent) ; Čech, Vladimír (vedoucí práce)
doctoral thesis deals with the study of surface properties of single-layer and multilayer thin films deposited from of vinyltriethoxysilane and tetravinylsilane monomers. It also deals with adhesion characterization of single layer tetravinylsilane films. The plasma polymerized thin films were prepared under steady-state deposition conditions on polished silicon wafers using plasma-enhanced chemical vapor deposition. The surface properties of the films were been characterized by different scanning probe microscopy methods and nanoindentation techniques such as conventional depth-sensing nanoindentation and load-partial-unload (cyclic) nanoindentation. While, the nanoscratch test was used to characterize the film adhesion properties. Single layer films prepared at different deposition conditions were characterized with respect to surface morphology and mechanical properties (Young’s modulus and hardness). The results of surface morphology, grain analysis, nanoindentation, finite elemental analysis and modulus mapping helped to know the hybrid nature of single layer films that were deposited at higher powers of RF-discharge. A novel approach was used in surface characterization of multilayer film by scanning probe microscopy and nanoindentation. The adhesion behavior of plasma polymer films of different mechanical properties and film thickness were analyzed by normal and lateral forces, friction coefficient, and scratch images obtained by atomic force microscopy.
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Study of Thin-Film Surfaces
Trivedi, Rutul Rajendra ; Fejfar, Antonín (oponent) ; Klapetek, Petr (oponent) ; Šikola, Tomáš (oponent) ; Čech, Vladimír (vedoucí práce)
doctoral thesis deals with the study of surface properties of single-layer and multilayer thin films deposited from of vinyltriethoxysilane and tetravinylsilane monomers. It also deals with adhesion characterization of single layer tetravinylsilane films. The plasma polymerized thin films were prepared under steady-state deposition conditions on polished silicon wafers using plasma-enhanced chemical vapor deposition. The surface properties of the films were been characterized by different scanning probe microscopy methods and nanoindentation techniques such as conventional depth-sensing nanoindentation and load-partial-unload (cyclic) nanoindentation. While, the nanoscratch test was used to characterize the film adhesion properties. Single layer films prepared at different deposition conditions were characterized with respect to surface morphology and mechanical properties (Young’s modulus and hardness). The results of surface morphology, grain analysis, nanoindentation, finite elemental analysis and modulus mapping helped to know the hybrid nature of single layer films that were deposited at higher powers of RF-discharge. A novel approach was used in surface characterization of multilayer film by scanning probe microscopy and nanoindentation. The adhesion behavior of plasma polymer films of different mechanical properties and film thickness were analyzed by normal and lateral forces, friction coefficient, and scratch images obtained by atomic force microscopy.
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