Original title: Thermal stability of Ti/Ni multilayer thin films
Authors: Václavík, R. ; Zábranský, L. ; Souček, P. ; Sťahel, P. ; Buršík, Jiří ; Fořt, Tomáš ; Buršíková, V.
Document type: Papers
Conference/Event: International Conference on Nanomaterials - Research & Application /12./, Brno (CZ), 20201021
Year: 2021
Language: eng
Abstract: In this work, thermal stability and mechanical properties of Ti/Ni multilayer thin films were studied. The multilayer thin films were synthesised by alternately depositing Ti and Ni layers using magnetron sputtering. The thickness of constituent layers of Ti and Ni varied from 1.7 nm to 10 nm, and one coating was deposited by simultaneous sputtering of both targets. Single crystalline silicon was used as a substrate. The effects of thermal treatment on the mechanical properties were studied using nanoindentation and discussed in relation to microstructure evaluated by X-ray diffraction. Annealing was carried out under low-pressure conditions for 2 hours in the range of 100-800 degrees C.
Keywords: annealing; magnetron sputtering; multilayers; nanoindentation; Ti/Ni
Project no.: GA20-11321S (CEP)
Funding provider: GA ČR
Host item entry: NANOCON 2020. 12th International Conference on Nanomaterials - Research & Application. Conference proceedings, ISBN 978-80-87294-98-7, ISSN 2694-930X
Note: Související webová stránka: https://www.confer.cz/nanocon/2020/3776-mechanical-properties-of-multilayers-characterised-using-advanced-methods

Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0325484

Permalink: http://www.nusl.cz/ntk/nusl-508292


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Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers
 Record created 2022-09-28, last modified 2022-09-28


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