Original title: SMV-2021-02: Vývoj a realizace amplitudové masky pro justáž optomechanických soustav
Translated title: SMV-2021-02: Development and implementation of amplitude masks for adjustment of optomechanical systems
Authors: Meluzín, Petr ; Chlumská, Jana ; Kolařík, Vladimír ; Kopal, Jaroslav
Document type: Research reports
Year: 2021
Language: cze
Abstract: [cze] [eng]

Keywords: e-beam lithography; lithography mask

Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0321889

Permalink: http://www.nusl.cz/ntk/nusl-449117


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Research > Institutes ASCR > Institute of Scientific Instruments
Reports > Research reports
 Record created 2021-09-05, last modified 2022-09-29


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