Original title: Conjugated Silicon – Based Polymer Resists for Nanotechnologies: EB and UV Mediated Degradation Processes in Polysilanes
Authors: Schauer, F. ; Schauer, Petr ; Kuřitka, I. ; Hua, B.
Document type: Papers
Conference/Event: CJCS’09 - Czech-Japan-China Cooperative Symposium on Nanostructure of Advanced Materials and Nanotechnology /4./, Brno (CZ), 2009-08-10 / 2009-08-14
Year: 2009
Language: eng
Abstract: The main purpose of this paper is to compare the photoluminescence (PL) and cathodoluminescence (CL) after major degradation, predominantly in long wavelength range 400 - 600 nm, studying the disorder due to dangling bonds, conformational transformations and weak bonds created by the degradation process.
Keywords: cathodoluminescence; photoluminescence; silicon-based polymer resist
Project no.: CEZ:AV0Z20650511 (CEP)
Host item entry: Proceedings of the 4th Czech-Japan-China Cooperative Symposium on Nanostructure of Advanced Materials and Nanotechnology (CJCS’09), ISBN 978-80-254-4535-8

Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0179805

Permalink: http://www.nusl.cz/ntk/nusl-40971


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Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers