Název:
Hiding e-beam exposure fields by deterministic 2D pattering
Autoři:
Horáček, Miroslav ; Knápek, Alexandr ; Matějka, Milan ; Krátký, Stanislav ; Urbánek, M. ; Mika, Filip ; Kolařík, Vladimír Typ dokumentu: Příspěvky z konference Konference/Akce: Recent Trends in Charged Particle Optics and Surface Physics Instrumentation, Skalský dvůr (CZ), 20180604
Rok:
2018
Jazyk:
eng
Abstrakt: The high stability and good current homogeneity in the spot of the e-beam writer is crucial to\nthe exposure quality, particularly in the case of large-area structures when gray-scale\nlithography is used. Even though the deflection field distortion is calibrated regularly and\nbeam focus and beam astigmatism is dynamically corrected over the entire deflection field, we can observe disturbances in the exposed relief.\nRecently, we presented a method that makes use of e–beam exposure imperfection by\nintroducing marginally visible high–frequency diffraction gratings of variable pitch that fill in\nseparate orthogonal exposure fields. The actually presented approach follows up our\nresearch on aperiodic arrangements of optical primitives, especially on the phyllotactic–\nlike arrangement of sub–micron relief optical elements. This approach is extended from the\ndiffraction element arrangement to the higher level of exposure fields arrangements.
Klíčová slova:
electron beam lithography; phyllotaxis Číslo projektu: TE01020233 (CEP), TG03010046 (CEP), LO1212 (CEP), ED0017/01/01 Poskytovatel projektu: GA TA ČR, GA TA ČR, GA MŠk, GA MŠk Zdrojový dokument: Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Proceedings of the 16th International Seminar, ISBN 978-80-87441-23-7
Instituce: Ústav přístrojové techniky AV ČR
(web)
Informace o dostupnosti dokumentu:
Dokument je dostupný v příslušném ústavu Akademie věd ČR. Původní záznam: http://hdl.handle.net/11104/0287595