Original title: Amplitudově fázová vortexová maska
Translated title: An Amplitude-Phase Vortex Photo Mask
Authors: Krátký, Stanislav ; Meluzín, Petr ; Urbánek, Michal ; Matějka, Milan ; Chlumská, Jana ; Horáček, Miroslav ; Kolařík, Vladimír
Document type: Papers
Conference/Event: LASER 55, Třešť (CZ), 2015-10-21 / 2015-10-23
Year: 2015
Language: cze
Abstract: [cze] [eng]

Keywords: e-beam lithography; photo mask; vortex beam
Project no.: LO1212 (CEP), ED0017/01/01, TE01020233 (CEP)
Funding provider: GA MŠk, GA MŠk, GA TA ČR
Host item entry: Sborník příspěvků multioborové konference LASER 55, ISBN 978-80-87441-16-9

Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0251045

Permalink: http://www.nusl.cz/ntk/nusl-200879


The record appears in these collections:
Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers
 Record created 2015-11-04, last modified 2021-11-24


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