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Gecko mimicking surfaces
Fecko, Peter ; Boušek, Jaroslav (oponent) ; Pekárek, Jan (vedoucí práce)
Adhesive capabilities of a gecko lizard have been the subject of many studies and an inspiration for many artificial imitations and inventions. This work proposes a design version of synthetic gecko structures in a form of micro-pillars, that would have similar adhesion capabilities as gecko setae. Structures made of Parylene C polymer have been created using photolithography and silicon etching techniques. Following focus was on various methods of surface modifications and characterisation of these structures to determine the adhesion forces on their surface, before and after modifications.
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SMV-2018-04: Planární mikrostruktury pro optické aplikace
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav ; Fořt, Tomáš ; Oulehla, Jindřich ; Pokorný, Pavel
Vývoj planárních mikrostruktur pro optické aplikace a následná realizace vzorků metodou elektronové litografie a dalších technik. Projekt zahrnuje studium materiálů vhodných pro vytvoření planární mikrostruktury v kovové vrstvě s ohledem na dosažitelné rozlišení a splnění požadavků na absorbanci v dané aplikaci. Elektronová litografie je použita pro vytvoření požadovaného motivu v rezistové vrstvě, která slouží jako maska pro leptání kovové vrstvy různými technikami (mokré leptání, reaktivní iontové leptání). Součástí projektu je i sepsání technické dokumentace o vyvinutých postupech a připravených vzorcích.
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Controlled structuring of self-assembled polystyrene microsphere arrays by two different plasma systems
Domonkos, Mária ; Ižák, Tibor ; Stolcova, L. ; Proška, J. ; Kromka, Alexander
In this study we present a successful manipulation of microspheres by reactive ion etching (RIE). A self-assembled monolayer close-packed array of monodisperse polystyrene microspheres (PM) with diameter of 471 nm was used as the primary template. The PM templates were processed in two different RIE systems: (i) capacitively coupled radiofrequency plasma (CCP) and (ii) dual plasma system which combines CCP and pulsed linear-antenna microwave plasma (PLAMWP). The influence of process conditions on the PM geometry was systematically studied by scanning electron microscopy (SEM). It was found out that choosing optimal parameters results in a tunable diameter of PM with various shapes (from spheres to pyramid-like structures) while keeping their periodic hexagonal ordering.
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Konstrukce odměřovacího systému pro systém reaktivního iontového leptání
Maňka, Tadeáš ; Antoš, Martin (oponent) ; Šerý, Mojmír (vedoucí práce)
Cílem této diplomové práce je zkonstruovat funkční odměřovací systém pro systém reaktivního iontového leptání (RIE). V práci je použit předchozí návrh Michelsonova interferometru vyvinutého na Ústavu přístrojové techniky, v.v.i. (ÚPT). Teoretická část práce se věnuje problematice interferenčních metod pro přesné měření délek. V další části je popsán proces leptání pomocí RIE. V praktické části je navržena testovací sestava z dílů firmy Thorlabs. Na ní je odzkoušena funkčnost a přesnost měření je porovnána s profilometrem. Dalším krokem je optimalizace navržené sestavy. Byla vytvořena technická dokumentace a vyrobena odměřovací aparatura na míru pro účely pracovníků ÚPT.
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Applications of self-assembled 2D polystyrene nanosphere arrays
Domonkos, Mária ; Ižák, Tibor ; Demo, Pavel ; Kromka, Alexander
In this study nanosphere lithography (NSL) is demonstrated to be a low-cost, parallel and material independent fabrication process for creating periodic arrays of nanostructures using self-assembled nanospheres as templates. SA is the most feasible way to fabricate 2D or 3D colloidal crystals on large areas. After the mask preparation NSL uses different steps of plasma etching and deposition processes. The resulting patterned nanostructures have a wide range of applications in many important areas such as photonics, antireflection, surface wetting, biological and chemical sensing, solar cells, etc. This study focuses on an overview of applications of 2D colloidal crystals. First, structuring of substrate surfaces and the creation of various nano-objects (nanotips, nanopillars, nanocones) is shown. Next, direct growth of patterned structures (graphene nanomesh and diamond structures) is pointed out.
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Controlled structuring of self–assembled polystyrene microsphere arrays by two different plasma systems
Domonkos, Mária ; Ižák, Tibor ; Štolcová, L. ; Proška, J. ; Kromka, Alexander
In this study we present a successful manipulation of microspheres by reactive ion etching (RIE). A self-assembled monolayer close-packed array of monodisperse polystyrene microspheres (PM) with diameter of 471 nm was used as the primary template. The PM templates were processed in two different RIE systems: (i) capacitively coupled radiofrequency plasma (CCP) and (ii) dual plasma system which combines CCP and pulsed linear-antenna microwave plasma (PLAMWP). The influence of process conditions on the PM geometry was systematically studied by scanning electron microscopy (SEM). The process conditions were controlled by varying radiofrequency (RF) power, gas mixture (O2:CF4 ratio) and process duration.
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Reactive ion etching of polystyrene microspheres
Domonkos, Mária ; Ižák, Tibor ; Štolcová, L. ; Proška, J. ; Kromka, Alexander
This article gives a brief insight also into the principle of the nanosphere lithography and various plasma systems focusing on their properties and applicability for a subsequent topographical modification of surfaces prepared by NS lithography. In the experimental part of this study we present a successful manipulation of microspheres by reactive ion etching (RIE). A self-assembled monolayer close-packed array of monodisperse polystyrene microspheres is used as the primary template. The polystyrene microspheres (PM) were processed in capacitively coupled radiofrequency plasma (CCP) RIE system. The influence of process conditions on the PM geometry is systematically studied by scanning electron microscopy. The process conditions are controlled by varying radiofrequency power, total pressure, composition of the gas mixture (ratio O2:CF4) and process duration.
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Nano modification of the W(100)/ZrO electron emitter tip using reactive ion etching
Horáček, Miroslav ; Matějka, František ; Kolařík, Vladimír ; Matějka, Milan ; Urbánek, Michal
The W(100)/ZrO electron emitter tip is typically prepared from a tungsten single-crystal shaft of a diameter of 125 μm using electrochemical anodic etching. In order to prepare an emitter for e-beam writer with a shaped beam it is desirable to etch the tip with a radius around 100 nm. Despite the anodic etching is precisely controlled using dedicated software, the desired final form shape of the emitter tip is not achieved in every case. The correcting anodic etching is not possible due to the technology principle of the etching itself. We present in this contribution the procedure that modifies/repairs the tungsten tip shape in a nanoscale region using a reactive ion etching (RIE) in CF4 + O2 gaseous mix in a barrel type reactor at the radio frequency of 13,56 MHz and the working pressure of 1000 Pa. The change of the geometry after the RIE process is checked using a high resolution scanning electron microscope. The influence of the tip modification of the activated thermal-field W(100)/ZrO electron emitter on its emission characteristics is also presented.
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Structuring of diamond films by reactive ion plasma etching
Domonkos, M. ; Ižák, Tibor ; Proška, J. ; Kromka, Alexander
In this study, two common strategies of diamond film structuring are described. Main focus is on the comparison of top-down and the bottom-up strategies. The top-down strategy is primary related to dry reactive ion etching through masking materials (or even without mask), while bottom-up strategy is based on selective area deposition of diamond film. Several methods of both strategies are demonstrated in details in the article, regarding to their properties and basic principles.
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