Original title: Stanovení křivek citlivosti pro litograf s gaussovským svazkem
Translated title: The contrast curves determination for e-beam writer with Gaussian beam
Authors: Šuľan, Dušan ; Horáček,, Miroslav (referee) ; Krátký, Stanislav (advisor)
Document type: Bachelor's theses
Year: 2014
Language: cze
Publisher: Vysoké učení technické v Brně. Fakulta elektrotechniky a komunikačních technologií
Abstract: [cze] [eng]

Keywords: Electron-beam lithography; Electron-beam writer; PMMA; resist contrast curve; Elektronová litografie; elektronový litograf; křivka citlivosti rezistu; PMMA.

Institution: Brno University of Technology (web)
Document availability information: Fulltext is available in the Brno University of Technology Digital Library.
Original record: http://hdl.handle.net/11012/33956

Permalink: http://www.nusl.cz/ntk/nusl-577838


The record appears in these collections:
Universities and colleges > Public universities > Brno University of Technology
Academic theses (ETDs) > Bachelor's theses
 Record created 2024-04-02, last modified 2024-04-03


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