Original title: Temperature monitoring of the EBL facility
Authors: Kolařík, Vladimír ; Horáček, Miroslav ; Matějka, František
Document type: Papers
Conference/Event: Electronic devices and systems conference 2002, Brno (CZ), 2002-06-09 / 2002-06-10
Year: 2002
Language: eng
Abstract: The long-term temperature stability of the EBL Laboratory is a crucial condition required for homogenous large-area expositions. A temperature monitoring system and run-time conditions are summarised in this paper.
Keywords: data analysis; electron-beam lithography; temperature monitoring
Project no.: CEZ:AV0Z2065902 (CEP), IBS2065014 (CEP)
Funding provider: GA AV ČR
Host item entry: Electronic devices and systems 02 - proceedings. Experimental methods in acoustic and electromagnetic emission, ISBN 80-214-2180-0

Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0101138

Permalink: http://www.nusl.cz/ntk/nusl-29561


The record appears in these collections:
Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers
 Record created 2011-07-01, last modified 2021-11-24


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