Original title:
Temperature monitoring of the EBL facility
Authors:
Kolařík, Vladimír ; Horáček, Miroslav ; Matějka, František Document type: Papers Conference/Event: Electronic devices and systems conference 2002, Brno (CZ), 2002-06-09 / 2002-06-10
Year:
2002
Language:
eng Abstract:
The long-term temperature stability of the EBL Laboratory is a crucial condition required for homogenous large-area expositions. A temperature monitoring system and run-time conditions are summarised in this paper.
Keywords:
data analysis; electron-beam lithography; temperature monitoring Project no.: CEZ:AV0Z2065902 (CEP), IBS2065014 (CEP) Funding provider: GA AV ČR Host item entry: Electronic devices and systems 02 - proceedings. Experimental methods in acoustic and electromagnetic emission, ISBN 80-214-2180-0
Institution: Institute of Scientific Instruments AS ČR
(web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences. Original record: http://hdl.handle.net/11104/0101138