Original title: RF plasma deposition and characterization of organosilicon thin films from TEOS+O.SUB.2 gas mixtures
Authors: Peřina, Vratislav ; Janča, J.
Document type: Papers
Conference/Event: Symposium on Plasma Physics and Technology /17./, Prague (CZ), 1995-06-13 / 1995-06-16
Year: 1995
Language: eng
Host item entry: Proceedings of 17th Symposium on Plasma Physics and Technology

Institution: Nuclear Physics Institute AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0080038

Permalink: http://www.nusl.cz/ntk/nusl-27503


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Research > Institutes ASCR > Nuclear Physics Institute
Conference materials > Papers