Original title:
RF plasma deposition and characterization of organosilicon thin films from TEOS+O.SUB.2 gas mixtures
Authors:
Peřina, Vratislav ; Janča, J. Document type: Papers Conference/Event: Symposium on Plasma Physics and Technology /17./, Prague (CZ), 1995-06-13 / 1995-06-16
Year:
1995
Language:
eng Host item entry: Proceedings of 17th Symposium on Plasma Physics and Technology
Institution: Nuclear Physics Institute AS ČR
(web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences. Original record: http://hdl.handle.net/11104/0080038