Název:
In situ XPS characterization of diamond films after AR.sup.+./sup. cluster ion beam sputtering
Autoři:
Artemenko, Anna ; Babchenko, Oleg ; Kozak, Halyna ; Ukraintsev, Egor ; Ižák, Tibor ; Romanyuk, Olexandr ; Potocký, Štěpán ; Kromka, Alexander Typ dokumentu: Příspěvky z konference Konference/Akce: NANOCON 2015. International Conference /7./, Brno (CZ), 20151014
Rok:
2015
Jazyk:
eng
Abstrakt: In this work, in situ XPS analysis of chemical composition of H- and O-terminated nano- and microcrystalline diamond (NCD and MCD) films before and after their sputtering by the Ar+ cluster ion beam was investigated. Scanning electron microscopy confirmed sputtering of all diamond surfaces with a rate about 0.5 nm/min. Raman spectroscopy and XPS revealed surface graphitization of diamond surface induced by sputtering. Moreover, XPS data showed the presence of about 0.7 % of Ar atoms on the investigated diamond surface after 66 min of sputtering. Also, oxygen residuals were still presented on the H-NCD surface after 66 min of sputtering. In contrast, no oxygen was found on the H-MCD surface just after 2 min of sputtering. Surface composition is discussed in respect to the diamond films growth parameters and surface structure.
Klíčová slova:
depth profiling; diamond; Raman; sputtering; XPS Číslo projektu: GA15-01687S (CEP) Poskytovatel projektu: GA ČR Zdrojový dokument: NANOCON 2015: 7th International Conference on Nanomaterials - Research and Application, Conference Proceedings, ISBN 978-80-87294-63-5
Instituce: Fyzikální ústav AV ČR
(web)
Informace o dostupnosti dokumentu:
Dokument je dostupný v příslušném ústavu Akademie věd ČR. Původní záznam: http://hdl.handle.net/11104/0253621