guest ::
| Home > Conference materials > Papers > E-beam Nano-patterning for Electroforming Replication |
Original title:
E-beam Nano-patterning for Electroforming Replication
Authors: Krátký, Stanislav ; Kolařík, Vladimír ; Urbánek, Michal ; Paták, Aleš ; Horáček, Miroslav ; Matějka, Milan
Document type: Papers
Conference/Event: NANOCON 2014. International Conference /6./, Brno (CZ), 2014-11-05 / 2014-11-07
Year: 2014
Language: eng
Abstract: This contribution deals with nano-patterning by the way of electron beam lithography with satisfying requirements for electroforming replication of desired patterns. Electron beam lithography can be used for creating nano graphics (images, text etc.) due to its very high resolution and precision. However, patterns created by electron beam lithography cannot be applied for mass production directly because of resist material soft nature (usually a polymer material). Because of that, hard printing plate must be produced. Nickel plate prepared by electroforming is one of the ways to accomplish that. Prior to the production of nickel plate by electroforming, the surface of polymer material has to be covered by a sufficiently thick layer of metal. This procedure can lead to a partial destruction of the motif (completely covered by metal) thus the decreasing of nano graphics resolution. In this paper several nano graphics (images and text with various resolutions) are prepared in positive resist PMMA (thickness of 2000 nm) by e-beam lithography. Chemical developer (pentyl acetate) was used for wet developing of prepared patterns. The sputtering of silver (100 nm) was carried out to achieve sufficient thickness of conductive layer for electroforming. Electron scanning microscope was used for evaluation, which one of the images and texts are still recognizable.
Keywords: electroforming; electron beam lithography; metal sputtering; nano graphics; polymethyl methacrylate
Project no.: LO1212 (CEP), ED0017/01/01, TE01020233 (CEP)
Funding provider: GA MŠk, GA MŠk, GA TA ČR
Host item entry: NANOCON 2014. 6th International conference proceedings, ISBN 978-80-87294-55-0
Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0241328
Permalink: http://www.nusl.cz/ntk/nusl-178290
The record appears in these collections:
Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers
Authors: Krátký, Stanislav ; Kolařík, Vladimír ; Urbánek, Michal ; Paták, Aleš ; Horáček, Miroslav ; Matějka, Milan
Document type: Papers
Conference/Event: NANOCON 2014. International Conference /6./, Brno (CZ), 2014-11-05 / 2014-11-07
Year: 2014
Language: eng
Abstract: This contribution deals with nano-patterning by the way of electron beam lithography with satisfying requirements for electroforming replication of desired patterns. Electron beam lithography can be used for creating nano graphics (images, text etc.) due to its very high resolution and precision. However, patterns created by electron beam lithography cannot be applied for mass production directly because of resist material soft nature (usually a polymer material). Because of that, hard printing plate must be produced. Nickel plate prepared by electroforming is one of the ways to accomplish that. Prior to the production of nickel plate by electroforming, the surface of polymer material has to be covered by a sufficiently thick layer of metal. This procedure can lead to a partial destruction of the motif (completely covered by metal) thus the decreasing of nano graphics resolution. In this paper several nano graphics (images and text with various resolutions) are prepared in positive resist PMMA (thickness of 2000 nm) by e-beam lithography. Chemical developer (pentyl acetate) was used for wet developing of prepared patterns. The sputtering of silver (100 nm) was carried out to achieve sufficient thickness of conductive layer for electroforming. Electron scanning microscope was used for evaluation, which one of the images and texts are still recognizable.
Keywords: electroforming; electron beam lithography; metal sputtering; nano graphics; polymethyl methacrylate
Project no.: LO1212 (CEP), ED0017/01/01, TE01020233 (CEP)
Funding provider: GA MŠk, GA MŠk, GA TA ČR
Host item entry: NANOCON 2014. 6th International conference proceedings, ISBN 978-80-87294-55-0
Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0241328
Permalink: http://www.nusl.cz/ntk/nusl-178290
The record appears in these collections:
Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers
Record created 2015-01-05, last modified 2021-11-24