Original title:
Some Other Gratings: Benchmarks for Large-Area E-Beam Nanopatterning
Authors:
Meluzín, Petr ; Horáček, Miroslav ; Urbánek, Michal ; Bok, Jan ; Krátký, Stanislav ; Matějka, Milan ; Chlumská, Jana ; Kolařík, Vladimír Document type: Papers Conference/Event: NANOCON 2014. International Conference /6./, Brno (CZ), 2014-11-05 / 2014-11-07
Year:
2014
Language:
eng Abstract:
E-beam lithography is a flexible technology for diffraction gratings origination. Nevertheless, requirements of the high optical quality of large area diffractive structures imply various severe challenges to e-beam delineating processes. This paper summarizes the e-beam process parameters that influence the quality of large area grating structures. Next, we propose some new methods to prepare diffraction gratings that were found to be useful for testing and benchmarking purposes. Those methods include single line gratings, labyrinth structures, fractional structures, tiling patterns, quasi regular filling structures and forked line structures. Various samples were prepared with the standard and newly developed e-beam patterning processes using both e-beam writers available: one with the Gaussian beam at 100 keV and another one with the shaped beam at 15 keV. Some of the results are presented further in this paper, their variants and parameters are discussed as well as their usefulness as benchmarking e-beam patterns for large area optical structures, elements and devices.
Keywords:
diffraction gratings; e-beam writer; fractal gratings; optical nano structures Project no.: LO1212 (CEP), ED0017/01/01 Funding provider: GA MŠk, GA MŠk Host item entry: NANOCON 2014. 6th International conference proceedings, ISBN 978-80-87294-55-0
Institution: Institute of Scientific Instruments AS ČR
(web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences. Original record: http://hdl.handle.net/11104/0241326