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Original title:
Exposure Time Comparison between E-beam Writer with Gaussian Beam and Variable Shaped Beam
Authors: Horáček, Miroslav ; Krátký, Stanislav ; Urbánek, Michal ; Kolařík, Vladimír ; Meluzín, Petr ; Matějka, Milan ; Chlumská, Jana
Document type: Papers
Conference/Event: NANOCON 2014. International Conference /6./, Brno (CZ), 2014-11-05 / 2014-11-07
Year: 2014
Language: eng
Abstract: One of the main goals in e-beam lithography is to increase exposure speed to achieve higher throughput. There are basically two types of electron-beam writers, shaped beam lithography systems and Gaussian beam lithography systems. The exposure time of both e-beam writers consist in essence of beam-on time, deflection system stabilization time and stage movement time. Exposure time testing was carried out on two types of patterns. There were completely filled in areas, binary period gratings (ratio 1:1 between exposed and unexposed areas), and multileveled structures (computer generated holograms). Exposures data was prepared according to standard technology (PMMA resist, exposure dose, non-alcoholic based developer) for both systems. The result of experiment shows that variable shaped beam system has advantage in multileveled structures while the Gaussian beam system is more suitable for gratings type of pattern. It was proved that combination of both systems has its use to increase exposures throughput.
Keywords: e-beam writer; Gaussian beam; variable shaped beam
Project no.: LO1212 (CEP), ED0017/01/01, TE01020118 (CEP)
Funding provider: GA MŠk, GA MŠk, GA TA ČR
Host item entry: NANOCON 2014. 6th International conference proceedings, ISBN 978-80-87294-55-0
Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0241322
Permalink: http://www.nusl.cz/ntk/nusl-178287
The record appears in these collections:
Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers
Authors: Horáček, Miroslav ; Krátký, Stanislav ; Urbánek, Michal ; Kolařík, Vladimír ; Meluzín, Petr ; Matějka, Milan ; Chlumská, Jana
Document type: Papers
Conference/Event: NANOCON 2014. International Conference /6./, Brno (CZ), 2014-11-05 / 2014-11-07
Year: 2014
Language: eng
Abstract: One of the main goals in e-beam lithography is to increase exposure speed to achieve higher throughput. There are basically two types of electron-beam writers, shaped beam lithography systems and Gaussian beam lithography systems. The exposure time of both e-beam writers consist in essence of beam-on time, deflection system stabilization time and stage movement time. Exposure time testing was carried out on two types of patterns. There were completely filled in areas, binary period gratings (ratio 1:1 between exposed and unexposed areas), and multileveled structures (computer generated holograms). Exposures data was prepared according to standard technology (PMMA resist, exposure dose, non-alcoholic based developer) for both systems. The result of experiment shows that variable shaped beam system has advantage in multileveled structures while the Gaussian beam system is more suitable for gratings type of pattern. It was proved that combination of both systems has its use to increase exposures throughput.
Keywords: e-beam writer; Gaussian beam; variable shaped beam
Project no.: LO1212 (CEP), ED0017/01/01, TE01020118 (CEP)
Funding provider: GA MŠk, GA MŠk, GA TA ČR
Host item entry: NANOCON 2014. 6th International conference proceedings, ISBN 978-80-87294-55-0
Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0241322
Permalink: http://www.nusl.cz/ntk/nusl-178287
The record appears in these collections:
Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers
Record created 2015-01-05, last modified 2021-11-24