Original title: Microstructuring of metallic layers for sensor applications
Authors: Kolařík, Vladimír ; Krátký, Stanislav ; Urbánek, Michal ; Matějka, Milan ; Chlumská, Jana ; Horáček, Miroslav
Document type: Papers
Conference/Event: METAL 2013. International Conference on Metallurgy and Materials /22./, Brno (CZ), 2013-05-15 / 2013-05-17
Year: 2013
Language: eng
Abstract: This contribution deals with a patterning of thin metallic layers using the masking technique by electron beam lithography. It is mainly concentrated on procedures to prepare finger structure in thin Gold layer on electrically isolated Silicon wafer. Both positive and negative tone resists are used for patterning. The thin layer is structured by the wet etching or by the lift-off technique. The prepared structures are intended to be used as a conductivity sensor for a variety of sensor applications. Patterning of the thin layer is performed by the e-beam writer with shaped rectangular beam BS600 by direct writing (without the glass photo mask). Besides the main technology process based on the direct-write e-beam lithography, other auxiliary issues are also discussed such as stitching and overlay precision of the process, throughput of this approach, issues of the thin layer adhesion on the substrate, inter-operation control and measurement techniques.
Keywords: electron beam lithography; gold etching; interdigitated sensor; lift-off
Project no.: ED0017/01/01, TE01020233 (CEP)
Funding provider: GA MŠk, GA TA ČR
Host item entry: METAL 2013 Conference Proceedings. 22nd International Conference on Metallurgy and Materials, ISBN 978-80-87294-41-3

Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0234518

Permalink: http://www.nusl.cz/ntk/nusl-174788


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Research > Institutes ASCR > Institute of Scientific Instruments
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