guest ::
| Home > Conference materials > Papers > E-beam pattern generator BS600 and technology zoom |
Original title:
E-beam pattern generator BS600 and technology zoom
Authors: Kolařík, Vladimír ; Horáček, Miroslav ; Matějka, František ; Matějka, Milan ; Urbánek, Michal ; Krátký, Stanislav ; Král, Stanislav ; Bok, Jan
Document type: Papers
Conference/Event: NANOCON 2012. International Conference /4./, Brno (CZ), 2012-10-23 / 2012-10-25
Year: 2012
Language: eng
Abstract: This contribution deals with an electron beam pattern generator (ELG) working with a rectangular shape variable size electron beam originally developed at Institute of Scientific Instruments (ISI), later on commercialized as a BS600 series by former company Tesla, and recently upgraded by ISI cooperating with several partners. The key issue of this paper is a recently developed exposure mode which is called Technology Zoom (TZ mode) since its original concept until the recent progress. This ELG operating in the TZ mode provides three main advantages when compared to the standard exposure mode: higher exposure speed due to increased beam current density; finer stamp size adjustment and sharper stamp shape due to the stronger size reduction of the shaping aperture. Further, we discussed also some drawbacks and practical issues of the TZ mode. And finally, we summarize some results on real exposure examples. The new exposure mode (together with other recent upgrades) makes the BS600 pattern generator very useful for the nanotechnology patterning tasks and challenges.
Keywords: E-beam lithography; E-beam pattern generator; reduced size shaped beam
Project no.: ED0017/01/01, FR-TI1/576 (CEP)
Funding provider: GA MŠk, GA MPO
Host item entry: NANOCON 2012, 4th International Conference Proceedings, ISBN 978-80-87294-32-1
Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0219948
Permalink: http://www.nusl.cz/ntk/nusl-151690
The record appears in these collections:
Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers
Authors: Kolařík, Vladimír ; Horáček, Miroslav ; Matějka, František ; Matějka, Milan ; Urbánek, Michal ; Krátký, Stanislav ; Král, Stanislav ; Bok, Jan
Document type: Papers
Conference/Event: NANOCON 2012. International Conference /4./, Brno (CZ), 2012-10-23 / 2012-10-25
Year: 2012
Language: eng
Abstract: This contribution deals with an electron beam pattern generator (ELG) working with a rectangular shape variable size electron beam originally developed at Institute of Scientific Instruments (ISI), later on commercialized as a BS600 series by former company Tesla, and recently upgraded by ISI cooperating with several partners. The key issue of this paper is a recently developed exposure mode which is called Technology Zoom (TZ mode) since its original concept until the recent progress. This ELG operating in the TZ mode provides three main advantages when compared to the standard exposure mode: higher exposure speed due to increased beam current density; finer stamp size adjustment and sharper stamp shape due to the stronger size reduction of the shaping aperture. Further, we discussed also some drawbacks and practical issues of the TZ mode. And finally, we summarize some results on real exposure examples. The new exposure mode (together with other recent upgrades) makes the BS600 pattern generator very useful for the nanotechnology patterning tasks and challenges.
Keywords: E-beam lithography; E-beam pattern generator; reduced size shaped beam
Project no.: ED0017/01/01, FR-TI1/576 (CEP)
Funding provider: GA MŠk, GA MPO
Host item entry: NANOCON 2012, 4th International Conference Proceedings, ISBN 978-80-87294-32-1
Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0219948
Permalink: http://www.nusl.cz/ntk/nusl-151690
The record appears in these collections:
Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers
Record created 2013-03-20, last modified 2021-11-24