Název:
E-beam pattern generator BS600 and technology zoom
Autoři:
Kolařík, Vladimír ; Horáček, Miroslav ; Matějka, František ; Matějka, Milan ; Urbánek, Michal ; Krátký, Stanislav ; Král, Stanislav ; Bok, Jan Typ dokumentu: Příspěvky z konference Konference/Akce: NANOCON 2012. International Conference /4./, Brno (CZ), 2012-10-23 / 2012-10-25
Rok:
2012
Jazyk:
eng
Abstrakt: This contribution deals with an electron beam pattern generator (ELG) working with a rectangular shape variable size electron beam originally developed at Institute of Scientific Instruments (ISI), later on commercialized as a BS600 series by former company Tesla, and recently upgraded by ISI cooperating with several partners. The key issue of this paper is a recently developed exposure mode which is called Technology Zoom (TZ mode) since its original concept until the recent progress. This ELG operating in the TZ mode provides three main advantages when compared to the standard exposure mode: higher exposure speed due to increased beam current density; finer stamp size adjustment and sharper stamp shape due to the stronger size reduction of the shaping aperture. Further, we discussed also some drawbacks and practical issues of the TZ mode. And finally, we summarize some results on real exposure examples. The new exposure mode (together with other recent upgrades) makes the BS600 pattern generator very useful for the nanotechnology patterning tasks and challenges.
Klíčová slova:
E-beam lithography; E-beam pattern generator; reduced size shaped beam Číslo projektu: ED0017/01/01, FR-TI1/576 (CEP) Poskytovatel projektu: GA MŠk, GA MPO Zdrojový dokument: NANOCON 2012, 4th International Conference Proceedings, ISBN 978-80-87294-32-1
Instituce: Ústav přístrojové techniky AV ČR
(web)
Informace o dostupnosti dokumentu:
Dokument je dostupný v příslušném ústavu Akademie věd ČR. Původní záznam: http://hdl.handle.net/11104/0219948