Název: Influence of annealing to stress in CNx:(H) films observed by SLEEM
Autoři: Mikmeková, Eliška ; Mikmeková, Šárka ; Müllerová, Ilona ; Sobota, Jaroslav
Typ dokumentu: Příspěvky z konference
Konference/Akce: METAL 2012. International Conference on Metallurgy and Materials /21./, Brno (CZ), 2012-05-23 / 2012-05-25
Rok: 2012
Jazyk: eng
Abstrakt: The effect of high residual stress on the quality of thin sputtered carbon nitride films has been studied by Scanning Low Energy Electron Microscopy (SLEEM). Basically, two different types of stress can be identified in thin films: compressive stress and tensile stress. Compressive stress leads to wrinkling and film delamination and tensile stress can cause the fracturing of thin films. Experiments were made in the Tescan TS 5130 MM equipped with the Cathode Lens system (CL), which enable us to observe samples at arbitrary landing energies of the illuminating electrons. Operating of a SEM at low energies offers several advantages: an increase of materials contrast via low energy, high ratio SE, BSE signal and noise, smaller interaction volume and elimination of charging effects. The effect of annealing in vacuum to residual stress (calculated from Stoney’s equation) was measured. The porous character of films was observed by thermal desorption spectroscopy (TDS).
Klíčová slova: carbon nitrides; residual stress; SLEEM; TDS
Číslo projektu: ED0017/01/01
Poskytovatel projektu: GA MŠk
Zdrojový dokument: METAL 2012 Conference Proceedings. 21st International Conference on Metallurgy and Materials, ISBN 978-80-87294-29-1

Instituce: Ústav přístrojové techniky AV ČR (web)
Informace o dostupnosti dokumentu: Dokument je dostupný v příslušném ústavu Akademie věd ČR.
Původní záznam: http://hdl.handle.net/11104/0216577

Trvalý odkaz NUŠL: http://www.nusl.cz/ntk/nusl-136071


Záznam je zařazen do těchto sbírek:
Věda a výzkum > AV ČR > Ústav přístrojové techniky
Konferenční materiály > Příspěvky z konference