Original title: Influence of annealing to stress in CNx:(H) films observed by SLEEM
Authors: Mikmeková, Eliška ; Mikmeková, Šárka ; Müllerová, Ilona ; Sobota, Jaroslav
Document type: Papers
Conference/Event: METAL 2012. International Conference on Metallurgy and Materials /21./, Brno (CZ), 2012-05-23 / 2012-05-25
Year: 2012
Language: eng
Abstract: The effect of high residual stress on the quality of thin sputtered carbon nitride films has been studied by Scanning Low Energy Electron Microscopy (SLEEM). Basically, two different types of stress can be identified in thin films: compressive stress and tensile stress. Compressive stress leads to wrinkling and film delamination and tensile stress can cause the fracturing of thin films. Experiments were made in the Tescan TS 5130 MM equipped with the Cathode Lens system (CL), which enable us to observe samples at arbitrary landing energies of the illuminating electrons. Operating of a SEM at low energies offers several advantages: an increase of materials contrast via low energy, high ratio SE, BSE signal and noise, smaller interaction volume and elimination of charging effects. The effect of annealing in vacuum to residual stress (calculated from Stoney’s equation) was measured. The porous character of films was observed by thermal desorption spectroscopy (TDS).
Keywords: carbon nitrides; residual stress; SLEEM; TDS
Project no.: ED0017/01/01
Funding provider: GA MŠk
Host item entry: METAL 2012 Conference Proceedings. 21st International Conference on Metallurgy and Materials, ISBN 978-80-87294-29-1

Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0216577

Permalink: http://www.nusl.cz/ntk/nusl-136071


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