Original title: Proximity effect simulation for variable shape e-beam writer
Authors: Kolařík, Vladimír ; Matějka, Milan ; Urbánek, Michal ; Král, Stanislav ; Krátký, Stanislav ; Mikšík, P. ; Vašina, J.
Document type: Papers
Conference/Event: International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation /13./, Skalský dvůr (CZ), 2012-06-25 / 2012-06-29
Year: 2012
Language: eng
Abstract: Electron Beam Writer (EBW) is a lithographic tool allowing generation of patterns in high resolution. The writing is carried out into a layer of a sensitive material (resist), which is deposited on the substrate surface (e.g. silicon). The resolution of the EBW is limited not only by the beam spot size, but also by the electron scattering effects (forward scattering, backscattering). Thus, even if the beam spot size on the resist surface is very small, due to electron scattering effect in the resist, the exposed area is significantly broader than the original beam spot size [1, 2].
Keywords: computer simulation; e-beam writer; electron scattering effects
Project no.: ED0017/01/01, FR-TI1/576 (CEP)
Funding provider: GA MŠk, GA MPO
Host item entry: Proceedings of the 13th International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation, ISBN 978-80-87441-07-7

Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0215699

Permalink: http://www.nusl.cz/ntk/nusl-136003


The record appears in these collections:
Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers