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Nanocrystalline diamond films deposition by PECVD in ASTEX type microwave reactor
Jašek, O. ; Karásková, M. ; Buršíková, V. ; Zajíčková, L. ; Franta, D. ; Frgala, Z. ; Matějková, Jiřina ; Rek, Antonín ; Klapetek, P. ; Buršík, Jiří
Nanocrystalline diamond film was deposited by microwave CVD in the ASTeX type reactor on a mirror polished (111) oriented n-doped silicon substrate. The deposition mixture consisted of 9 pct of methane in hydrogen. The applied microwave power (2.45 GHz)and pressure were 850 W and 7.5 kPa, respectively. The substrate temperature was 1 090 K. The diamond nucleation process was enhanced by rf induced dc selfbias of -125 V. The film exhibited very low roughness (rms of heights 9.1 nm). Its hardness and elastic modules were 70 and 375 GPa, respectively. The optical constants were determined by combination of spectroscopic ellipsometry and reflectometry employing the Rayleigh-Rice theory for the roughness and the dispersion model of optical constants based on the parameterization of densities of states. The deposition rate was 57 nm/min including the 5 min nucleation step.
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Studium mechanických vlastností supertvrdých nanostrukturních vrstev
Buršíková, V. ; Jašek, O. ; Frgala, Z. ; Karásková, M. ; Zajíčková, L. ; Buršík, Jiří ; Bláhová, O. ; Grančič, B. ; Mikula, M. ; Klapetek, P.
Study of Mechanical Properties of Superhard Nanostructured Thin Films.
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Mechanical properties of nanocrystaline diamond thin films
Buršíková, V. ; Frgala, Z. ; Jašek, O. ; Karásková, M. ; Zajíčková, L. ; Franta, D. ; Buršík, Jiří ; Klapetek, P. ; Bláhová, O. ; Matějková, Jiřina
Mechanical properties of nanocrystaline diamond films.
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