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Original title:
Nanopatterning of Silicon Nitride Membranes
Authors: Matějka, Milan ; Krátký, Stanislav ; Řiháček, Tomáš ; Kolařík, Vladimír ; Chlumská, Jana ; Urbánek, Michal
Document type: Papers
Conference/Event: NANOCON 2016. International Conference on Nanomaterials - Research and Application /8./, Brno (CZ), 20161019
Year: 2017
Language: eng
Abstract: Membranes are typically created by a thin silicon nitride (SIN) layer deposited on a silicon wafer. Both, top and bottom side of the wafer is covered by a thin layer of the silicon nitride. The principle of silicon nitride membranes preparation is based on the wet anisotropic etching of the bottom side of the silicon wafer with crystallographic orientation (100). While the basic procedure for the preparation of such membranes is well known, the nano patterning of thin membranes presents quite important challenges. This is partially due to the mechanical stress which is typically presented within such membranes. The resolution requirements of the membrane patterning have gradually increased. Advanced lithographic techniques and etching procedures had to be developed. This paper summarizes theoretical aspects, technological issues and achieved results. The application potential of silicon nitride membranes as a base for multifunctional micro system (MMS) is also\ndiscussed.
Keywords: anisotropic etching; e-beam writer; nano patterning; silicon nitride membranes
Project no.: TE01020233 (CEP), LO1212 (CEP), ED0017/01/01
Funding provider: GA TA ČR, GA MŠk, GA MŠk
Host item entry: NANOCON 2016. 8th International Conference on Nanomaterials - Research and Application. Conference Proceedings, ISBN 978-80-87294-71-0
Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0270768
Permalink: http://www.nusl.cz/ntk/nusl-264737
The record appears in these collections:
Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers
Authors: Matějka, Milan ; Krátký, Stanislav ; Řiháček, Tomáš ; Kolařík, Vladimír ; Chlumská, Jana ; Urbánek, Michal
Document type: Papers
Conference/Event: NANOCON 2016. International Conference on Nanomaterials - Research and Application /8./, Brno (CZ), 20161019
Year: 2017
Language: eng
Abstract: Membranes are typically created by a thin silicon nitride (SIN) layer deposited on a silicon wafer. Both, top and bottom side of the wafer is covered by a thin layer of the silicon nitride. The principle of silicon nitride membranes preparation is based on the wet anisotropic etching of the bottom side of the silicon wafer with crystallographic orientation (100). While the basic procedure for the preparation of such membranes is well known, the nano patterning of thin membranes presents quite important challenges. This is partially due to the mechanical stress which is typically presented within such membranes. The resolution requirements of the membrane patterning have gradually increased. Advanced lithographic techniques and etching procedures had to be developed. This paper summarizes theoretical aspects, technological issues and achieved results. The application potential of silicon nitride membranes as a base for multifunctional micro system (MMS) is also\ndiscussed.
Keywords: anisotropic etching; e-beam writer; nano patterning; silicon nitride membranes
Project no.: TE01020233 (CEP), LO1212 (CEP), ED0017/01/01
Funding provider: GA TA ČR, GA MŠk, GA MŠk
Host item entry: NANOCON 2016. 8th International Conference on Nanomaterials - Research and Application. Conference Proceedings, ISBN 978-80-87294-71-0
Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0270768
Permalink: http://www.nusl.cz/ntk/nusl-264737
The record appears in these collections:
Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers
Record created 2017-04-04, last modified 2022-09-29