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Reliability of Lead-free Solders and the Selected Methods to Estimate its Lifetime
Švecová, Olga ; Kolařík, Vladimír (referee) ; Urbánek,, Jan (referee) ; Šandera, Josef (advisor)
The doctoral thesis is focused on reliability of lead-free solder SAC 305. Knowledge in the field of fatigue models used in determining the lifetime of solder joints are observed in this thesis. Also such methods of predicting reliability as numerically-analytical methods or reliability experimental tests are mentioned. Practical results of reliability measurement are presented. Experimental data served as the foundation for determining empirical coefficients for the fatigue model based on deformation induced by creep of the solder, which was implemented in the ANSYS environment. Results from different methods were compared and conclusions discussing the suitability of the presented prediction methods are formulated.
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Planar Circuits Elements on Low Temperature Cofired Ceramics
Kosina, Petr ; Dřímal, Jiří (referee) ; Kolařík, Vladimír (referee) ; Šandera, Josef (advisor)
The present work deals with the design and manufacturing of 3D structures in LTCC (Low Temperatue Cofired Ceramics) technology. To use this technology LTCC workplaces have been designed and technological processes for high quality reproducible production were suggested. Technological possibilities of low temperature co-fired ceramics were demonstrated in the design and manufacturing of pressure sensors, electrode systems for ozone generators, planar circuit elements (coils and transformers) and in the design a special package for middle-power terahertz modulator. Design of selected parts of respective devices was proved by simulations in COMSOL Multiphysics. The work provides new insights into the structure of power integrated circuits sleeves and structure of electrode systems for different types of electrical discharges. Results of this work can contribute significantly in the application of planar circuit elements, in the development of different types of sensors, in the design of atypical types of packaging or in the design of electrode systems for capacitive coupled electrical discharges.
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Manufacturing of Relief Diffractive Structures for Optical Elements Using Electron Beam Lithograph
Daněk, Lukáš ; Urban, František (referee) ; Klapetek,, Petr (referee) ; Kolařík, Vladimír (advisor)
This thesis describes several techniques for the optimization of the manufacturing of relief diffractive structures used as optical elements by Electron beam lithograph BS600 in the Electron beam laboratory of the Institute of Scientific Instruments of the Academy of Sciences of the Czech Republic. The Electron beam lithograph BS600 was originally developed and constructed in the Institute of Scientific Instruments of the Academy of Sciences of the Czech Republic for Tesla in 1983, but is still developing, which was published. The Electron been lithograph BS600 is specific in these days because of its accelerating potential and is unique in the world because of the possibility to shape the beam. The optimization of manufacturing of relief diffractive structures, used as optical elements, was mostly reached by analysis, bringing optimal solution for the required effect. Moreover, an algorithm was developed for driving the electron beam position, shape, size and the time of each elementary exposition. The analysis showed that is convenient to use mathematical description of separate lines of diffractive structures. A separate subject was carried out for the calibration of the exposition field of the Electron beam lithograph BS600.
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Optical response of asymmetric plasmonic structures
Babocký, Jiří ; Kolařík, Vladimír (referee) ; Čechal, Jan (advisor)
This diploma thesis deals with study of resonance modes of plasmonic structures. First part provides an overview of theoretical models, which explain the resonanace modes in plasmonic structures. Next part describes technology of electron beam lithography. First section of experimental part deas with technological processes leading to an improvement of resulting structures made by electron beam lithography that is followed by lift-off process. Last part focuses on a study of reflectance spactra of plasmonic antenas and the identification of resonance modes.
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Optimization of diffractive structures
Chalupa, Petr ; Šandera, Josef (referee) ; Kolařík, Vladimír (advisor)
This work is focused on the possibility of sunlight concentration on silicon dies or silicon stripes. The main aim of this work is the design and realization of the concentration element, or system, which is based on diffractive optics and optimized to achieve possibly high optical efficiency. The theoretical part deals with problems of photovoltaic systems and sunlight concentration. The practical part deals with design of optical microstructures and their realization by e-beam lithography using the electron-beam writer BS600. Microstructures created in the electron resist on silicon substrates or embossed into transparent materials are measured in the laboratory. We evaluated and compared their optical properties, which gives some feedback for further optimizations. Transparent elements are tested with real silicon dies and so overall properties of a prototyped photovoltaic module can be evaluated.
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SMV-2015-15: Development of combined amplitude/phase photo masks
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of transparent and opaque optical structures by means of electron beam lithography in a recording material supported by a glass substrate. The research covers the analysis of the graphical motive, its topology and morphology, research and application of binary and relief structures performing required graphical and optical properties, development of technology for the preparation of combined photo masks that process both the amplitude and the phase of the light beam, verification of optical properties of such masks.
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SMV-2015-14: Development of e-beam lithography technology
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Development of the devices for electron beam lithography technology. Research and development cover the complete lithography system, in particular Schottky Zro/W electron emitter, electron optical column including beam forming system, X-Y stage, high vacuum system, control system electronics.
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SMV-2015-13: Relief structures based on diffractive optics
Krátký, Stanislav ; Kolařík, Vladimír ; Horáček, Miroslav ; Matějka, Milan ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of optical structures based on the principle of diffractive optics by means of electron beam lithography in a recording material supported by a silicon or glass board. The research covers the analysis of the optical motive, research and application of relief structures implementing the required optical properties, research and modeling of the physical possibilities of implementation of relief structures, preparation and analysis of technology of implementation of relief structures with regard to the limits of current scientific instruments, verification of theoretical considerations by means of relief structure sample exposure.
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