Národní úložiště šedé literatury Nalezeno 27 záznamů.  předchozí11 - 20další  přejít na záznam: Hledání trvalo 0.01 vteřin. 
Zmenšení rozměru pravoúhlého elektronového svazku v elektronovém litografu
Matějka, František ; Horáček, Miroslav ; Lencová, Bohumila ; Kolařík, Vladimír
Úpravou elektronově optického systému byl zmenšen minimální rozměr razítka v elektronovém litografu pracujícím s pravoúhlým tvarovatelným svazkem ze 100 nm na 50 nm. Následně došlo ke zvýšení rychlosti zápisu díky čtyřikrát zvýšené proudové hustotě.
Uhlíkové nanotrubice - měření elektrických vlastností
Ficek, R. ; Vrba, R. ; Zajíčková, L. ; Eliáš, M. ; Matějka, František ; Kolařík, Vladimír ; Matějková, Jiřina
Elektrickou vodivost nanotrubic můžeme měřit na námi sestrojeném zařízení. Vzorky nanotrubic připravené metodou PECVD jsou extrahovány do roztoku a naneseny na měřicí čip. Pomocí hrotového zařízení jsou měřeny hodnoty napětí a proudu jednotlivých nanotrubic. Je uvažována možnost vývoje zařízení pro nanesení nanotrubic na hroty pro AFM (Atomic Force Microscopy).
Optoelectronic pressure sensor with Si.sub.3./sub.N.sub.4./sub. diaphragm
Beneš, P. ; Matějka, František ; Vrba, R. ; Kolařík, V.
Sensitive pressure sensor with nitride membrane and optoelectronic read-out system is described. Measured pressure is transformed into the deformation of a thick layer nitride membrane. Nitride membrane creates a mirror for laser beam and moves with reflected laser mark. Its position is sensed via a position sensing device - photo lateral diode. Diode double current signal is amplified and conditioned digitally by ADuC 812 microcomputer. This one chip provides an IEEE 1451.2 interface.
Temperature monitoring of the EBL facility
Kolařík, Vladimír ; Horáček, Miroslav ; Matějka, František
The long-term temperature stability of the EBL Laboratory is a crucial condition required for homogenous large-area expositions. A temperature monitoring system and run-time conditions are summarised in this paper.
Diffractive Optics: Analysis, Design and Fabrication of Diffractive Optical Elements
Fiala, P. ; Matějka, František ; Richter, I. ; Škereň, M.
This contribution presents results obtained in the field of diffractive optics, covering practically all aspects of the analysis, design and realization process of the diffractive optical elements (DOEs). As for the analysis, using the rigorous diffraction methods, we have recently been able to efficiently analyze various diffraction gratings. Concerning the synthesis, several design strategies have been studied and implemented for designing both binary and multi-level phase DOEs. Using the numerically computed designs, E-beam lithography technology has been chosen for fabricating both binary and multi-level phase DOEs, using the BS 600 e-beam lithographic facility at ISI AS CR. Finally, some typical examples of optical reconstructions are presented and discussed.
Study of Nitride Silicon Membrane for Pressure Sensors
Matějka, František ; Matějková, Jiřina ; Vrba, R.
This paper presents results of study of membrane distortion obtained by measuring membrane deflection in several cross sections by means of Talystep scanning profiler and by a new designed optical diffractive method. Mentioned methods were applied for analyses of diaphragms fabricated using LPCVD Si.sub.3./sub.N.sub.4./sub. layers with 150 nm thick layer deposited on silicon substrate with crystallographic orientation (100). As a result there are space models of distortion of the whole membrane surface caused by known pressure acting to the membrane. Those models are exploited to optimize design of pressure sensor and modeling and simutation of its properties.
Optimisation of Reliefs of Thin Polymer Films of Resist for Phase Diffractive Optical Elements
Matějka, František ; Matějková, Jiřina
Electron-beam lithography uses polymer electron resists mostly for recording of picture information. The behaviour of these polymer electron resists, under influence of the electron of the given energy, is expressed by the sensitivity curve. The curve of sensitivity is constructed as dependence of the relative change of thickness of the functional layer of resist, on the density of the absorbed energy.
Optimization of reliefs of thin polymer films of resist for phase diffractive optical elements
Matějka, František ; Matějková, Jiřina
Electron beam lithography uses polymer electron resists mostly for recording of picture information. The behaviour of these polymer electron resists, under influence of the electron of the given energy, is expressed by the sensitivity curve. The curve of sensitivity is constructed as dependence of the relative change of thickness of the functional layer of resist, on the density of the absorbed energy.
Test Specimens for SEM
Matějka, František ; Ryzí, Z.
In most applications SEM devices are utilized in the area of magnification quite far from the high limit. For such cases we prepare objects interesting for SEM by using special techniques of microfabrication. Those objects can be called test patterns. Compared with natural objects, they have an advantage: their geometry and dimensions are determined with high precision. Another advantage may be that the test pattern can be created from materials with well known properties. In our laboratories we prepare test specimens using electron-beam lithography and the anisotropic etching of silicon and using holographic techniques. We have designed the topography of anisotropically etched measuring test specimen ".mu.-scale".In most applications SEM devices are utilized in the area of magnification quite far from the high limit. For such cases we prepare objects interesting for SEM by using special techniques of microfabrication. Those objects can be called test patterns. Compared with natural objects, they have an advantage: their geometry and dimensions are determined with high precision. Another advantage may be that the test pattern can be created from materials with well known properties. In our laboratories we prepare test specimens using electron-beam lithography and the anisotropic etching of silicon and using holographic techniques. We have designed the topography of anisotropically etched measuring test specimen ".mu.-scale".

Národní úložiště šedé literatury : Nalezeno 27 záznamů.   předchozí11 - 20další  přejít na záznam:
Viz též: podobná jména autorů
12 Matějka, Filip
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