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Integration of nanostructures into functional devices
Citterberg, Daniel ; Mikulík, Petr (referee) ; Kolíbal, Miroslav (advisor)
This master thesis is focused on characterization of electrical transport properties of one-dimensional nanostructures. First section of this work deals with theoretical description of the experimental approaches to realization of such measurements. This section involves also a detail discussion of preparation of contacts using e-beam lithography. Next, theoretical description of characterization of nanostructures using photoluminescence measurements is given. Second section describes practical application of the aforementioned electrical transport measurements. Presented results include transport and photoluminescence measurements of WS2 nanotubes, InAs and WO2.72 nanowires. The last section of this thesis deals with nanowire quantum well heterostructures. The section provides both a deeper theoretical view of the problem and results of the photoluminescence measurements are shown.
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Design of automated set-up intended for inspection of PMMA coated silicon wafers
Drozd, Michal ; Sobola, Dinara (referee) ; Knápek, Alexandr (advisor)
Při ovrstvování substrátu tenkou vrstvou polymerního rezistu dochází k defektům, které mohou poškodit celou, někdy i několikadenní expozici pomocí svazku elektronů - elektronovou litografií. Kvalita nanesené vrstvy, která je potřebná k následnému deponování, je velmi důležitá z hlediska následné funkčnosti vyráběné nanostrukutry. Předběžnou kontrolu kvality naneseného resistu je možné dělat ručně pomocí světelného mikroskopu. V rámci této bakalářské práce vznikl prototyp zařízení, které tyto defekty dokáže detekovat automaticky. Přesněji jde o rastrovací zařízení pojmenované WaferScan, umožňující skenovat křemíkovou podložku (wafer) optickou kamerou a analýzou obrazu v počítači zjistit polohu a velikost defektů a prachových částic v rezistu naneseném na waferu. Celé zařízení se skládá ze dvou pohyblivých os x a y, které umožňují pohyb kamery, a příslušené elektroniky. Součástí je také software k ovládání zařízení a zpracování obrazu.
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SMV-2023-01: Relief structures based on diffractive optics
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of graphic and optical structures based on the principle of diffractive optics by means of electron beam lithography in a recording material supported by a silicon or glass board. The research covers the analysis of the graphical or optical motive, research and application of relief structures implementing the required graphic and optical properties, research and modeling of the physical possibilities of implementation of relief structures, preparation and analysis of technology of implementation of relief structures with regard to the limits of current scientific instruments, verification of theoretical considerations by means of relief structure sample exposure.
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SMV-2023-02: Relief optical elements for shaping light bundles
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of relief optical elements for shaping light bundles, metrology of samples of relief optical elements using various microscopic techniques with regard to analysis of relief degradation in production processes, consulting in the field of lithographic processes focusing on electron beam and subsequent replication processes. Design and optimization of microoptic structures for various configurations of projector lighting systems, metrology of selected optical microstructured reliefs and optical function analysis, optimization of materials for replication of microoptical structures, consulting in the field of replication of deep microoptic elements for various optical surfaces.
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SMV-2023-06: Development of test specimens for SEM
Matějka, Milan ; Krátký, Stanislav ; Meluzín, Petr ; Košelová, Zuzana ; Chlumská, Jana ; Horáček, Miroslav ; Kolařík, Vladimír ; Knápek, Alexandr
The study focuses on the research and development of precise calibration samples featuring relief structures. These samples are designed for calibrating parameters in scanning electron microscopes (SEM). The testing patterns enable the verification and calibration of magnification, orthogonality, and geometric distortion. The preparation of calibration specimens utilizes micro lithographic techniques tailored for silicon processing and other relevant technological procedures.
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SMV-2023-05: DI2023
Matějka, Milan ; Krátký, Stanislav ; Meluzín, Petr ; Košelová, Zuzana ; Chlumská, Jana ; Horáček, Miroslav ; Kolařík, Vladimír ; Knápek, Alexandr
The research focuses on the investigation and development of precise calibration samples with relief structures. These samples are designed for calibrating parameters in scanning electron microscopes (SEM). Test patterns allow verification of the imaging quality through microscopic techniques such as overall magnification, field of view size, resolution, deformation in lateral axes, and other geometric distortions. Precision lithographic techniques and other methods derived from silicon processing technologies in the semiconductor industry are employed for sample preparation. The development has been directed towards optimizing the recording of etching masks before transferring the image onto a monocrystalline silicon substrate.
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SMV-2022-01: Relief structures based on diffractive optics
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of graphic and optical structures based on the principle of diffractive optics by means of electron beam lithography in a recording material supported by a silicon or glass board. The research covers the analysis of the graphical or optical motive, research and application of relief structures implementing the required graphic and optical properties, research and modeling of the physical possibilities of implementation of relief structures, preparation and analysis of technology of implementation of relief structures with regard to the limits of current scientific instruments, verification of theoretical considerations by means of relief structure sample exposure.
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