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Imaging of thermal treated thin films on silicon substrate in the scanning low energy electron microscope
Zobačová, Jitka ; Mikmeková, Šárka ; Polčák, J. ; Frank, Luděk
Structure of thin films usually requires to be examined on microscopic level. The research topics like growth and stability of thin films, phase transitions and separation, crystallization, diffusion and defect formation has a need for LEED or XPS as techniques adequate for investigation of atomic transport processes on short length scales. The low energy electron microscopy is a complementary solution for imaging of samples with special concern for knowledge of surface physics and material science. In this contribution the microscopic examination of as-deposited and thermal treated thin films on Si substrates is performed.
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Depozice tenkých vrstev Ba.sub.x./sub.Sr.sub.1-x./sub.TiO.sub.3./sub. pomocí dvoutryskového RF plazmatického systému s efektem duté katody
Hubička, Zdeněk ; Virostko, Petr ; Olejníček, Jiří ; Deyneka, Alexander ; Adámek, Petr ; Valvoda, V. ; Jastrabík, Lubomír ; Šícha, Miloš ; Tichý, M.
Low-pressure plasma jet system with two hollow cathodes was used for deposition of BaxSr1-xTiO3 (BSTO) ferroelectric thin films. High density pulse modulated RF hollow cathode discharge was generated in ceramic nozzles made of SrTiO3 and BaTiO3. In the experiment, the composition of BSTO films was controlled by magnitude of average RF power applied on particular plasma jet guns. X-ray diffraction proved that BSTO thin films were polycrystalline with perovskite structure. Time resolved Langmuir probe system and plasma impedance monitor were used for ´in situ´ plasma diagnostics and control of deposition conditions.
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First principles study of polymorfy of Ni and Co thin layers
Zelený, Martin ; Šob, Mojmír
The total energy profiles of trigonal and hexagonal bulk Ni and Co are employed to advance our understanding of epitaxial growth of Ni and Co thin films on various fcc(111) substrates. For nickel films, we predict the fcc stacking in the neighbourhood of the ground state and for the distance of nearest neighbors larger than 5.18 a.u. the film should exhibit hcp layer stacking. Cobalt films behave differently. The hcp phases are energetically more favorable in whole region studied.
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