Original title: Příprava optických tenkých vrstev metodou depozice z chemických par
Translated title: Preparation of optical thin films by chemical vapor deposition
Authors: Koryčánek, Adam ; Kvapil, Michal (referee) ; Kolíbal, Miroslav (advisor)
Document type: Bachelor's theses
Year: 2024
Language: cze
Publisher: Vysoké učení technické v Brně. Fakulta strojního inženýrství
Abstract: [cze] [eng]

Keywords: antireflective layers; atomic force microscopy; atomic layer deposition; ellipsometry; hafnium oxide; physical vapor deposition; titanium oxide; x-ray photoelectron spectroscopy; antireflexní vrstvy; depozice atomárních vrstev; depozice z plynné fáze; elipsometrie; oxid hafničitý; oxid titaničitý; rastrovací sondová mikroskopie; rentgenová fotoelektronová spektroskopie

Institution: Brno University of Technology (web)
Document availability information: Fulltext is available in the Brno University of Technology Digital Library.
Original record: https://hdl.handle.net/11012/248269

Permalink: http://www.nusl.cz/ntk/nusl-620015


The record appears in these collections:
Universities and colleges > Public universities > Brno University of Technology
Academic theses (ETDs) > Bachelor's theses
 Record created 2024-06-22, last modified 2024-06-22


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