Original title: Plazmochemická depozice vrstev z plynné fáze s využitím směsí TVS/Ar a TVS/O2
Translated title: Plasma-enhanced chemical vapor deposition using TVS/Ar and TVS/O2 mixtures
Authors: Sadílek, Jakub ; Salyk, Ota (referee) ; Čech, Vladimír (advisor)
Document type: Master’s theses
Year: 2013
Language: eng
Publisher: Vysoké učení technické v Brně. Fakulta chemická
Abstract: [eng] [cze]

Keywords: a-SiC:H; a-SiCO:H; elipsometrie; Fourierovsky transformovaná infračervená spek-trometrie (FTIR); plazmochemická depozice z plyné fáze (PECVD); tenké vrstvy; Tetravinylsilane (TVS); a-SiC:H; a-SiCO:H; ellipsometry; Fourier transformed infrared spectrometry (FTIR); Plasma enhanced chemical vapor deposi-tion (PECVD); Tetravinylsilane (TVS); thin film

Institution: Brno University of Technology (web)
Document availability information: Fulltext is available in the Brno University of Technology Digital Library.
Original record: http://hdl.handle.net/11012/23373

Permalink: http://www.nusl.cz/ntk/nusl-599442


The record appears in these collections:
Universities and colleges > Public universities > Brno University of Technology
Academic theses (ETDs) > Master’s theses
 Record created 2024-04-02, last modified 2024-04-03


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