Original title: Transparent and conductive titanium nitride thin films for implantable bioelectronics deposited at low temperature using two Kaufman ion-beam sources
Authors: Jarušek, J. ; Gablech, I.
Document type: Papers
Language: eng
Publisher: Vysoké učení technické v Brně, Fakulta elektrotechniky a komunikačních technologií
Abstract: This work proposes ultra-thin films of titanium nitride as a material for the realization of transparent and conductive layers suitable for implantable bioelectronics. Results further show that good results of crystallography, transmittance, and sheet resistance can be achieved for thin films with thicknesses of 15 nm and 20 nm deposited at the beam energy of the primary ion source of 400 eV and temperature below 100 °C.
Keywords: bioelectronics implants; sputtering; thin films; titanium nitride; transparent conducting film; visible transmittance
Host item entry: Proceedings I of the 28st Conference STUDENT EEICT 2022: General papers, ISBN 978-80-214-6029-4

Institution: Brno University of Technology (web)
Document availability information: Fulltext is available in the Brno University of Technology Digital Library.
Original record: http://hdl.handle.net/11012/209297

Permalink: http://www.nusl.cz/ntk/nusl-524724


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