Original title: Kombinovaná elektronová litografie
Translated title: Combined Electron Beam Lithography
Authors: Krátký, Stanislav ; Mikulík, Petr (referee) ; Škereň,, Marek (referee) ; Kolařík, Vladimír (advisor)
Document type: Doctoral theses
Year: 2021
Language: cze
Publisher: Vysoké učení technické v Brně. Fakulta elektrotechniky a komunikačních technologií
Abstract: [cze] [eng]

Keywords: diffractive optical elements; Grayscale e-beam lithography; hybrid lithography; optimization of data preparation; plexiglass.; PMMA; proximity effect; difrakční optické elementy; hybridní litografie; optimalizace datové přípravy; plexisklo.; PMMA; proximity efekt; Reliéfní elektronová litografie

Institution: Brno University of Technology (web)
Document availability information: Fulltext is available in the Brno University of Technology Digital Library.
Original record: http://hdl.handle.net/11012/196542

Permalink: http://www.nusl.cz/ntk/nusl-438584


The record appears in these collections:
Universities and colleges > Public universities > Brno University of Technology
Academic theses (ETDs) > Doctoral theses
 Record created 2021-04-25, last modified 2022-09-04


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