Original title:
Study of intrinsic stress in CNx films prepared by magnetron sputtering device using electron microscopy
Authors:
Mikmeková, Eliška ; Sobota, Jaroslav ; Caha, O. ; Mikmeková, Šárka Document type: Papers Conference/Event: Mikroskopie 2010, Nové Město na Moravě (CZ), 2010-02-17 / 2010-02-18
Year:
2010
Language:
eng Abstract:
Preparation and analysis of amorphous carbon nitride thin films (CNx) deposited by RF magnetron sputtering device on silicon wafers (100) is reported.
Keywords:
carbon nitride; RF magnetron sputtering; thin films Project no.: CEZ:AV0Z20650511 (CEP) Host item entry: Mikroskopie 2010, ISBN N
Institution: Institute of Scientific Instruments AS ČR
(web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences. Original record: http://hdl.handle.net/11104/0006218