Original title: Determination of proximity effect forward scattering range parameter in e-beam lithography
Authors: Urbánek, Michal ; Kolařík, Vladimír ; Král, Stanislav ; Dvořáková, Marie
Document type: Papers
Conference/Event: International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation /12./, Skalský dvůr (CZ), 2010-05-31 / 2010-06-04
Year: 2010
Language: eng
Abstract: Electron beam lithography (EBL) is a tool for generation patterns with high resolution, so it is necesessary to control critical dimensions of created patterns, because the undesired influence of adjacent regions to those exposed can occur due to the proximity effect. Proximity effect is often described by two Gaussian function, where .alpha. represents forward scattering range parameter. Consequently, we present evaluation of proximity parameter .alpha. by various method in this paper.
Keywords: electron beam lithography; proximity effect
Project no.: CEZ:AV0Z20650511 (CEP), FR-TI1/576 (CEP), ED0017/01/01
Funding provider: GA MPO, GA MŠk
Host item entry: Proceedings of the 12th International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation, ISBN 978-80-254-6842-5

Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0190611

Permalink: http://www.nusl.cz/ntk/nusl-41931


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Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers