Název: Preparation of ppHMDSO Thin Films in Capacitively Coupled RF Glow Discharges under Dusty Plasma Conditions
Autoři: Homola, V. ; Buršíková, V. ; Kelar, L. ; Kelarová, Š. ; Stupavska, M. ; Peřina, Vratislav
Typ dokumentu: Příspěvky z konference
Konference/Akce: 9th International Conference on Nanomaterials - Research and Application (NANOCON 2017), Brno (CZ), 20171018
Rok: 2018
Jazyk: eng
Abstrakt: The deposition of organosilicone thin films from mixture of hexamethyldisiloxane (HMDSO) and oxygen by using capacitively coupled R.F. glow discharges under dusty plasma conditions was investigated. High resolution topography and mechanical property maps of the prepared films were acquired by using atomic force microscopy techniques. The chemical bond and composition of the deposited films were analyzed by Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS). The mechanical properties of the films were studied using quasistatic as well as dynamic nanoindentation tests and their surface free energies were evaluated by means of contact angle measuring technique using several testing liquids exhibiting various surface tensions. The thermal stability of the films was studied using thermal desorption spectroscopy. Neural network modelling was used to study the effect of plasma parameters on the hardness of ppHMDSO films
Klíčová slova: Hexamethyldisiloxane; mechanical properties; oxygen; PECVD
Číslo projektu: LM2015056 (CEP)
Poskytovatel projektu: GA MŠk
Zdrojový dokument: NANOCON 2017: Conference Proceedings, ISBN 978-80-87294-81-9

Instituce: Ústav jaderné fyziky AV ČR (web)
Informace o dostupnosti dokumentu: Dokument je dostupný v příslušném ústavu Akademie věd ČR.
Původní záznam: http://hdl.handle.net/11104/0288520

Trvalý odkaz NUŠL: http://www.nusl.cz/ntk/nusl-387685


Záznam je zařazen do těchto sbírek:
Věda a výzkum > AV ČR > Ústav jaderné fyziky
Konferenční materiály > Příspěvky z konference