Original title: Zajištění plošné homogenity při depozici složitých systémů vrstev
Translated title: Attaining surface homogeneity in the deposition of complex layer systems
Authors: Žídek, Karel
Document type: Research reports
Year: 2018
Language: cze
Abstract: [cze] [eng]
V této zprávě popisujeme postup optimalizace depozice interferenčního filtru s cílem dosáhnout homogenní tloušťky vrstvy na co největším rozsahu deponované plochy. Za použití depoziční masky a rotace depoziční kaloty dosahujeme homogenity ± 0.5% pro vzorky do průměru 5 cm. Zkoumáme poté vliv naklonění substrátu a depozici na zakřivený povrch čočky na homogenitu deponované vrstvy. We report on a procedure of optimization of a thin-film deposition process with respect to the best attainable layer homogeneity on a large deposited surface. By using a deposition mask and rotation of the deposition calotte, we reach the homogeneity of ± 0.5% for samples with the diameter up to 5 cm. Furthermore, we investigate the effect of substrate tilt and of a deposition on a curved lens surface with respect to homogeneity of the deposited layer.
Keywords: deposition mask; surface homogeneity; thin layer deposition
Project no.: LO1206 (CEP)
Funding provider: GA MŠk

Institution: Institute of Plasma Physics AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0287991

Permalink: http://www.nusl.cz/ntk/nusl-387522


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Research > Institutes ASCR > Institute of Plasma Physics
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