Original title: Thermal desorption spectroscopy in prototype furnace for chemical vapor deposition
Authors: Průcha, Lukáš ; Daniel, Benjamin ; Piňos, Jakub ; Mikmeková, Eliška
Document type: Papers
Conference/Event: Recent Trends in Charged Particle Optics and Surface Physics Instrumentation, Skalský dvůr (CZ), 20180604
Year: 2018
Language: eng
Abstract: Cleaning of the sample surfaces is crucial for scanning electron microscopy, especially for\nlow energy electron microscopy or for the deposition of thin layers, such as graphene,\nwhere surface has to be well prepared. In the best case, every unwanted particle should be\ncleaned from the sample surface for best low energy electron microscopy observation or thin\nfilm deposition. Unfortunately, the standard cleaning procedures can leave residues on the\nsample surface. This work is focused on thermal desorption spectroscopy (TDS). TDS is a method of observing desorbed molecules from a sample surface during the increase of\ntemperature of the sample. The aim of this study was to determine optimum conditions:\ntemperature and time, to achieve clean surfaces in the shortest time.
Keywords: CVD; silicon; surface cleaning; thermal desorption spectroscopy
Project no.: TE01020118 (CEP), LO1212 (CEP), ED0017/01/01
Funding provider: GA TA ČR, GA MŠk, GA MŠk
Host item entry: Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Proceedings of the 16th International Seminar, ISBN 978-80-87441-23-7

Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0287627

Permalink: http://www.nusl.cz/ntk/nusl-387510


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Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers